Flexible Micro- and Nano-Patterning Tools for Photonics
This Phase II STTR proposal seeks to enhance the throughput and resolution of LumArray"s maskless photolithography system, the ZP-150, so that it meets the needs of photonic systems for high-fidelity, long-range spatial-phase coherence, full-wafer coverage, 3D structuring, patterning on non-flat surfaces, and sub-100 nm resolution. The ZP-150 is designed for compatibility with research as well as customized manufacturing of electronics, photonics and other products that employ micro- and nanoscale features. To exercise and demonstrate the enhanced performance achieved in the ZP-150, complex photonic-device structures will be written as well as computer-generated holograms and a diffractive-optical solar converter with over 30% photovoltaic efficiency. To achieve the desired enhancements, 7 specific tasks are proposed.
Small Business Information at Submission:
Research Institution Information:
15 WARD STREET SOMERVILLE, MA -
Number of Employees:
University of Utah
1471 Federal Way
Salt Lake City, UT 84102-
Gary C. J.d.