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Dual-Band EUV Multilayer Coatings for Solar Physics

Award Information

Agency:
National Aeronautics and Space Administration
Branch:
N/A
Award ID:
Program Year/Program:
2012 / SBIR
Agency Tracking Number:
114315
Solicitation Year:
2011
Solicitation Topic Code:
S2.04
Solicitation Number:
Small Business Information
Reflective X-ray Optics, LLC
1361 Amsterdam Avenue, Suite 3B New York, NY 10027-2589
View profile »
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 2012
Title: Dual-Band EUV Multilayer Coatings for Solar Physics
Agency: NASA
Contract: NNX12CF48P
Award Amount: $124,999.00
 

Abstract:

We propose to develop and commercialize a new class of multilayer interference coating that is designed to provide high reflection efficiency in two disparate wavelength bands in the extreme ultraviolet (EUV), a so-called 'dual-band' EUV multilayer. A high-performance dual-band multilayer coating will allow for solar imaging or spectroscopy instruments that operate in two different EUV channels using a single instrument aperture. The realization of dual-band multilayer coatings having high reflectance at the target wavelengths, low reflectance of unwanted wavelengths, low film stress, and good thermal and temporal stability, will enable the construction of future solar instruments that have much higher collection efficiency, lower mass and volume, and lower costs than is currently possible using existing multilayer coating technology.The goal of our proposed Phase I program is to experimentally investigate the performance of a new type of dual-band coating design comprising two periodic multilayers separated by a low-absorption spacer layer. This approach results in the ability to independently tune the spectral response of both EUV wavebands, and to suppress unwanted wavelengths. We will explore both B4C/Si-Si-B4C/Mo-Si and SiC/Al-Al-Zr/Al designs. We also will investigate the use of novel capping layer structures comprising Ir, Ru or other metals, for enhanced reflectance and better coating resilience in harsh environments.

Principal Investigator:

David Windt
Principal Investigator
3478502212
davidwindt@gmail.com

Business Contact:

David Windt
Business Official
3478502212
davidwindt@gmail.com
Small Business Information at Submission:

Reflective X-ray Optics, LLC
1361 Amsterdam Avenue, Suite 3B New York, NY 10027-2589

EIN/Tax ID: 201910234
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No