Extended-SWIR Targeting Sensor
ABSTRACT: There is an increasing awareness of the advantages of solution-processed mesoscopic semiconductor devices. Compared to epitaxially-grown, lattice-matched, crystalline semiconductors, solution-processed optoelectronics offer fabrication without expensive and energy-intensive high-temperature and high-vacuum processes. To realize these benefits, a nanocrystal shortwave-infrared (SWIR) detector technology will be demonstrated. The detectors will be fabricated using facile solution-based processes. After characterizing the optical, morphological, and crystallographic properties of the nanocrystals, high performance SWIR films will be fabricated and characterized. Using novel application of inorganic chemical coatings the surface oxidation states of the nanocrystals will be optimized for both low dark current and low image lag. A variety of detectors will be fabricated and shown to exhibit extended spectral response (400-nm to 3000-nm), high responsivity, background limited (BLIP) performance, and high speed. The SWIR film's imaging performance will be demonstrated using existing readout integrated circuits. In Phase II, a large format, fully-functional extended-SWIR imager will be demonstrated. BENEFIT: The most recent developments in target tracking, target identification, and high-speed free-space communication involve the shortwave-infrared (SWIR) region of the electromagnetic spectrum. Lasers at SWIR wavelengths can be eye-safe at high power and propagate more efficiently through the atmosphere than visible lasers. These laser emissions are undetectable to most imaging technologies including silicon, CCD cameras, night-vision tubes, and long-wave IR cameras. SWIR applications include seeing battlefield lasers, facial recognition, battle damage assessment, seeing-through-dust, pilot vision enhancement, laser-aided spotting scope, active passive rangefinders, celestial navigation.
Small Business Information at Submission:
15985 NW Schendel Avenue Suite 200 Beaverton, OR -
Number of Employees: