USA flag logo/image

An Official Website of the United States Government

PRECURSORS FOR CARBON FREE ALGAAS

Award Information

Agency:
Department of Defense 		Branch:
Defense Advanced Research Projects Agency 		Award ID:
9392 		Program Year/Program:
1989 / SBIR
Agency Tracking Number:
9392 		Solicitation Year:
N/A 		Solicitation Topic Code:
N/A 		Solicitation Number:
N/A
Small Business Information
Advanced Technologies/Laboratories Intl
Advanced Technologies/Lab Intl 20010 Century Blvd, Ste 500 Germantown, MD 20874 0111
View profile »
Woman-Owned: Yes
Minority-Owned: Yes
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 1989
Title: PRECURSORS FOR CARBON FREE ALGAAS
Agency / Branch: DOD / DARPA
Contract: N/A
Award Amount: $72,992.00
 

Abstract:

WIDESPREAD APPLICATION OF HIGH PERFORMANCE DEVICES BASED ON III-VI COMPOUND SEMICONDUCTOR WILL DEPEND ON THE DEVELOPMENT OF ECONOMIC AND HIGH-QUALITY MANUFACTURING METHODS. DURING THE LAST FEW YEARS, ORGANOMETALLIC BASED PROCESSES HAVE EVOLVED INTO THE MOST PROMISING TECHNIQUES FOR THE PRODUCTION OF ULTRA-HIGH PURITY COMPOUND SEMICONDUCTOR MATERIALS IN COMPLEX LAYERED STRUCTURES REQUIRED FOR ADVANCED DEVICES. FEASIBILITY HAS BEEN DEMONSTRATED IN THE LABORATORY; EPITAXIAL LAYERS WITH THE REQUIRED INTERFACE ABRUPTNESS AND CLOSE TO THE REQUIRED PURITY HAVE BEEN OBTAINED FOR THE MATERIALS SYSTEMS OF MAJOR INTEREST, GAAS/ALGAAS AND GAINASP/INP. A MAJOR CHALLENGE NOW CONFRONTS BOTH THE MATERIALS AND CHEMICAL COMMUNITIES. SIGNIFICANT PROGRESS MUST BE MADE IN ALUMINUM PRECURSOR IDENTITY, QUALITY, AND CONSISTENCY. ALUMINUM-CONTAINING FILMS, EVEN P-TYPE LAYERS GROWN WITH ADDUCT PURIFIED TRIMETHYLALUMINUM, STILL CONTAIN UNACCEPTABLY HIGH QUANTITIES OF CARBON. IN PHASE I WE WILL DEMONSTRATE REDUCED CARBON INCORPORATION IN ALGAAS THROUGH THE INTRODUCTION OF A NEW ALUMINUM SOURCE REAGENT. IN PHASE II WE WILL DEVELOP MANUFACTURING METHODS FOR THE PRODUCTION OF ELECTRONIC GRADE MATERIAL.

Principal Investigator:

Dr Duncan W Brown
2033552681

Business Contact:

Small Business Information at Submission:

Advanced Technology Materials
520-b Danbury Rd New Milford, CT 06776

EIN/Tax ID:
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No