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NOVEL TUNGSTEN METALLO-ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD) SOURCE…

Award Information

Agency:
National Science Foundation 		Branch:
N/A 		Award ID:
10698 		Program Year/Program:
1989 / SBIR
Agency Tracking Number:
10698 		Solicitation Year:
N/A 		Solicitation Topic Code:
N/A 		Solicitation Number:
N/A
Small Business Information
Advanced Technologies/Laboratories Intl
Advanced Technologies/Lab Intl 20010 Century Blvd, Ste 500 Germantown, MD 20874 0111
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Woman-Owned: Yes
Minority-Owned: Yes
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 1989
Title: NOVEL TUNGSTEN METALLO-ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD) SOURCE REAGENTS FOR VLSI APPLICATIONS
Agency: NSF
Contract: N/A
Award Amount: $50,000.00
 

Abstract:

THE CONTINUED DRIVE TOWARD VLSI AND THREE-DIMENSIONAL INTEGRATION PLACES EVER-INCREASING DEMANDS ON METALIZATION STRUCTURES. NEW MATERIALS ARE NEEDED TO ADVANCE THESE VITALTECHNOLOGIES. THE MANY ADVANTAGES OF REFRACTORY METAL THIN FILMS PREPARED BY CHEMICAL VAPOR DEPOSITION (CVD) INCLUDING CONFORMAL STEP COVERAGE, HIGH ELECTRO-MIGRATION RESISTANCE AND LOW RESISTIVITY MAKE THEM ATTRACTIVE FOR GATE, INTERCONNECT, CONTACT, DIFFUSION BARRIER AND VIA PLUG METALIZATIONS. HOWEVER, THE APPLICATION OF CVD TUNGSTEN ANDMOLYBDENUM TO VLSI PROCESSING HAS BEEN IMPEDED BY THE SECONDARY REACTIONS CAUSED BY THE FLUORINE LIGANDS OF THE ELEMENTAL SOURCE REAGENTS USED IN THE CVD PROCESS. THESE REACTIONS ULTIMATELY LEAD TO THE FAILURE OF THE DEVICE. THEOBJECTIVES OF THE PROPOSED RESEARCH ARE THE ELABORATION OF ASET OF MOLECULAR DESIGN CRITERIA FOR REFRACTORY METAL SOURCEREAGENTS AND THE IDENTIFICATION OF A NOVEL ORGANOTUNGSTEN CVD SOURCE REAGENT WHICH REVOLUTIONIZES VLSI METALIZATION. THESE GOALS WILL BE MET BY APPLYING A MULTIDISCIPLINARY APPROACH IN WHICH RESULTS FROM FILM GROWTH AND FUNDAMENTAL DECOMPOSITION STUDIES ARE USED TO REFINE THE MOLECULAR STRUCTURE OF THE SOURCE REAGENTS.

Principal Investigator:

Peter S Kirlin
Principal Investigator
2033552681

Business Contact:

Small Business Information at Submission:

Advanced Technology Materials
520-b Danbury Rd New Milford, CT 06776

EIN/Tax ID:
DUNS: N/A
Number of Employees: N/A
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No