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PHOTO CHEMICAL VAPOR DEPOSITION OF BARIUM TITANATE

Award Information

Agency:
National Science Foundation
Branch:
N/A
Award ID:
21572
Program Year/Program:
1993 / SBIR
Agency Tracking Number:
21572
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
Advanced Technologies/Laboratories Intl
Advanced Technologies/Lab Intl 20010 Century Blvd, Ste 500 Germantown, MD 20874 0111
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Woman-Owned: Yes
Minority-Owned: Yes
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 1993
Title: PHOTO CHEMICAL VAPOR DEPOSITION OF BARIUM TITANATE
Agency: NSF
Contract: N/A
Award Amount: $50,000.00
 

Abstract:

FERROELECTRICS SHOW GREAT PROMISE AS ELECTRONIC MATERIALS IN APPLICATIONS RANGING FROM INFRARED DETECTORS TO OPTICAL SWITCHES. BRIUM TITANATE (BATIO3) IS AN ESPECIALLY PROMISING MATERIAL FOR THIN FILM CAPACITOR APPLICATIONS IN ULTRA-LARGE SCALE INTEGRATED CIRCUITS. CONVENTIONAL CHEMICAL VAPOR DEPOSITION (CVD) PROCESSING OF BATIO3 THIN FILMS REQUIRES TEMPERATURES THAT ARE INCOMPATIBLE WITH STANDARD SILICON PROCESSING TECHNOLOGY. PLASMA ENHANCED CVD OF BATIO3 SHOWS SOME POTENTIAL FOR LOWERING TEMPERATURES, BUT IT IS DIFFICULT TO ACHIEVE LARGE-SCALE UNIFORMITY. BOTH THE NON-UNIFORMITY AND TEMPERATURE PROBLEMS MAY BE SOLVED BY THE USE OF A NOVEL PHOTO-ENHANCED CVD PROCESS WHOSE FEASIBILITY WILL BE DETERMINED IN THIS STUDY.

Principal Investigator:

Jiming Zhang
2037941100

Business Contact:

Small Business Information at Submission:

Advanced Technology Materials
7 Commerce Dr Danbury, CT 06810

EIN/Tax ID:
DUNS: N/A
Number of Employees: N/A
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No