FERROELECTRIC HETEROSTRUCTURES FOR HIGH-DENSITY DRAMS
Agency / Branch:
DOD / MDA
The innovations of the proposed program are: 1) advancing thin-film deposition technology to achieve fully epitaxial growth of ferroelectric heterostructures on silicon substrates, by using the highly successful pulsed laser deposition (PLD) technique; 2) replacing the Pt bottom electrode with the epitaxial conductive oxide material; 3) achieving a full monolithic integration of high-density ferroelectric/conductive oxide capacitors with Si integrated circuits (ICs). The main thrust of Phase I will be to demonstrate the feasibility of epitaxial growth of a novel ferroelectric heterostructure, on top of an epitaxial YSZ buffered silicon substrate.
Small Business Information at Submission:
Principal Investigator:Qi Li, Phd
Advanced Fuel Research, Inc.
87 Church 380379 East Hartford, CT 06138
Number of Employees: