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Novel Antireflective Coating to Improve Microelectronic Processings

Award Information

Agency:
Department of Defense 		Branch:
Missile Defense Agency 		Award ID:
47559 		Program Year/Program:
2001 / SBIR
Agency Tracking Number:
00-0877 		Solicitation Year:
N/A 		Solicitation Topic Code:
N/A 		Solicitation Number:
N/A
Small Business Information
AST PRODUCTS, INC.
AST PRODUCTS, INC. 9 LINNELL CIR BILLERICA, MA 01821
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Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 2
Fiscal Year: 2001
Title: Novel Antireflective Coating to Improve Microelectronic Processings
Agency / Branch: DOD / MDA
Contract: DASG60-01-C-0065
Award Amount: $1,600,000.00
 

Abstract:

One of the primary processes used for device patterning in the electronics industry is deep ultaviolet photolithography. However, the highly reflective substrates require reduction of this reflectivity to minimize standing waves and to maintain tightdimensional control. Most of te industry uses anti-reflective coatings (ARCs) which are applied using the spin coating technique. Unfortunately, spin coating is not a conformal coating and tends to planarize complex geometries, essentially filling in theholes and rounding the features. This results in erosin of feature sidewalls and loss of dimensional integrity. The industry requires a new process for application of ARCs which is highly conformal, has low defect density and is equally applicable tosubstrates up to 12

Principal Investigator:

Mario Cazeca
Senior Scientist
9786637652
mcazeca@astp.com

Business Contact:

Ih-Houng Loh
President
9786637652
iloh@astp.com
Small Business Information at Submission:

AST PRODUCTS, INC.
9 Linnell Circle Billerica, MA 01821

EIN/Tax ID:
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No