High Energy Density and High Thermally Rated Pulsed Power Capacitor Devices
Agency / Branch:
DOD / OSD
The proposed program by AMBP Tech and Professor Sarjeant's group at SUNY Buffalo will develop and demonstrate a rapid large area deposition process of high energy density amorphous fluorinated carbon (a-C:F) films onto thin aluminum (4um thin) electrode substrates. The innovative research consists of utilizing AMBP Tech's patented high deposition rate technologies of LAMBD or PAMBD tools to optimize the stoichiometry and morphology of a-C:F films in terms of the energy density. Feedback will be provided by evaluating the electrical characteristics of the films via the unique Partial Discharge (PD) analytical setup of the Energy Systems Institute (ESI) directed by Professor Sarjeant.
Small Business Information at Submission:
AMBP TECH CORP.
c/o University Buffalo Incubator, 1576 Sweet Home Amherst, NY 14228
Number of Employees: