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SBIR Phase II: Relief-Free Infrared Diffractive Optics Based on Semiconductor…

Award Information

Agency:
National Science Foundation
Branch:
N/A
Award ID:
88238
Program Year/Program:
2009 / SBIR
Agency Tracking Number:
0740174
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
ANTEOS, Inc
105 Hartford Turnpike Shrewsbury, MA -
View profile »
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 2
Fiscal Year: 2009
Title: SBIR Phase II: Relief-Free Infrared Diffractive Optics Based on Semiconductor Materials
Agency: NSF
Contract: 0923706
Award Amount: $361,416.00
 

Abstract:

This award is funded under the American Recovery and Reinvestment Act of 2009 (Public Law 111-5). This Small Business Innovation Research (SBIR) Phase II project will develop a new generation of relief-free thin-plate components of diffractive optics operating in the infrared region of spectrum. The diffractive optics employs volume phase holographic structures, which are optically recorded in semiconductor materials transparent at the infrared wavelengths using proprietary process of photo-modification for producing dramatic change of the material refractive index under illumination with low intensity light. Phase I of this project proved feasibility of the proposed concept by demonstrating photo modification of ZnSe infrared material and fabricating the first model components. The developed technology can be immediately applied to fabrication of diffractive optics, volume phase holographic gratings, and phase retardation plates for wavelengths up to 1.9 ýým, as well as antireflection layers for wavelengths up to 8 ýým. In Phase II project the technology will be optimized and applied to fabrication of the prototype components of infrared diffractive optics operating at longer wavelengths, including the important wavelength of CO2 laser 10.6 ýým and windows of atmospheric transparency 3-5 and 8-12 ýým. The developed photo-modification process is highly adaptable and creates a rich technology platform for fabrication of a broad range of products for a large variety of markets. Successful implementation of this technology will result in a new generation of high efficiency relief-free infrared diffractive optics and sub-wavelength components, including diffraction gratings, beam splitters, beam shapers, semiconductor materials with artificial birefringence, phase retardation plates and wave plates. The relief-free components of infrared diffractive optics based on semiconductor materials are capable to withstand high light intensities and perform complicated light management functions. Another important application is the fabrication of highly stable anti-reflection (AR) layers on infrared semiconductor optics. The market for infrared diffractive optics includes defense and airspace industry, laser industry, spectral devices, sensors and detectors, night vision optics, industrial process control, material processing, cutting and welding, environmental monitoring, medical diagnostics and surgery.

Principal Investigator:

Sergei Krivoshlykov
PhD
5087543548
altairctr@aol.com

Business Contact:

Sergei Krivoshlykov
PhD
5087543548
altairctr@aol.com
Small Business Information at Submission:

ANTEOS, Inc.
105 Hartford Turnpike Shrewsbury, MA 01545

EIN/Tax ID: 205773080
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No