Submicron-Resolution, Large-Area, High-Throughput Patterning System for Electronic Modules
Agency / Branch:
DOD / MDA
This proposal presents a program for developing a novel patterning system technology that not only delivers submicron resolution over a large image field, but also produces high exposure throughput and eliminates the shortcomings of conventional systems. The new technology is highly attractive in the fabrication of semiconductor integrated circuits and flat-panel displays. Phase I will design a system based on the new concept and demonstrate its conceptual feasibility.
Small Business Information at Submission:
Principal Investigator:Jeffrey Hoffman
250 Clearbrook Rd Elmsford, NY 10523
Number of Employees: