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Submicron-Resolution, Large-Area, High-Throughput Patterning System for…

Award Information

Agency:
Department of Defense
Branch:
Missile Defense Agency
Award ID:
28359
Program Year/Program:
1997 / SBIR
Agency Tracking Number:
28359
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
Anvik Corporation
6 Skyline Dr. Hawthorne, NY 10532 0216
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Woman-Owned: No
Minority-Owned: Yes
HUBZone-Owned: No
 
Phase 2
Fiscal Year: 1997
Title: Submicron-Resolution, Large-Area, High-Throughput Patterning System for Electronic Modules
Agency / Branch: DOD / MDA
Contract: N/A
Award Amount: $750,000.00
 

Abstract:

This proposal presents a program for developing a novel patterning system technology that not only delivers submicron resolution over a large image field, but also produces high exposure throughput and eliminates the shortcomings of conventional systems. The new technology is highly attractive in the fabrication of semiconductor integrated circuits and flat-panel displays. Phase I will design a system based on the new concept and demonstrate its conceptual feasibility.

Principal Investigator:

Jeffrey Hoffman
9143452442

Business Contact:

Small Business Information at Submission:

Anvik Corp
250 Clearbrook Rd Elmsford, NY 10523

EIN/Tax ID:
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No