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Fabrication of High Electrical Mobility Transistors on Flexible Substrates for…

Award Information

Agency:
Department of Defense 		Branch:
Defense Advanced Research Projects Agency 		Award ID:
68879 		Program Year/Program:
2004 / STTR
Agency Tracking Number:
04ST1-0036 		Solicitation Year:
N/A 		Solicitation Topic Code:
N/A 		Solicitation Number:
N/A
Small Business Information
Anvik Corporation
6 Skyline Dr. Hawthorne, NY 10532 0216
View profile »
Woman-Owned: No
Minority-Owned: Yes
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 2004
Title: Fabrication of High Electrical Mobility Transistors on Flexible Substrates for Phased Array Radar and Terahertz Antennas
Agency / Branch: DOD / DARPA
Contract: W31P4Q-04-C-R316
Award Amount: $98,998.00
 

Abstract:

Compound semiconductor films are the key ingredient enabling the construction of ultrafast (>10 GHz) transistors. Materials such as Gallium Arsenide (GaAs), Gallium Nitride (GaN), Silicon Germanium (SiGe) and Indium Phosphide (InP) have shown great potential to enable a quantum leap in transistor performance. There are numerous commercial and military applications for such ultrafast transistors. A particularly challenging application area is for phased array radar and terahertz antenna fabrication. These devices require the construction of high frequency transistors on large (over 1 m2), flexible substrates in order to meet the demanding requirements for fast beam steering and high angular resolution for rapid target identification and tracking. In this STTR program, we propose to develop a new process technology for fabrication of high electrical mobility transistors (HEMTs) on flexible substrates. Commercial Kapton substrates with upper process temperatures of 300-450¿C will be used to support low (< 500¿C) temperature-deposited semiconductor films including Si, Ge, GaN, and InP. Sequential lateral solidification (SLS), an excimer laser crystallization process, will be performed in an appropriate background atmosphere to convert the as-deposited compound semiconductor films into low-defect-density microstructures, including large single-crystal regions. The resulting substrates will then be suitable for large-area patterning of HEMTs.

Principal Investigator:

Marc Zemel
Director of Engineering
9143452442
mzemel@anvik.com

Business Contact:

Kanti Jain
President
9143452442
kjain@anvik.com
Small Business Information at Submission:

ANVIK CORP.
6 Skyline Drive Hawthorne, NY 10532

EIN/Tax ID: 133457285
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
Research Institution Information:
Sandia National Laboratory
Microsystem Tech. Dept. 01851 , PO Box 5800, MS 0889
Albuquerque, NM 87185
Contact: Jon S. Custer
Contact Phone: (505) 845-8594
RI Type: Federally funded R&D center (FFRDC)