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High-Resolution, High-Efficiency, Curved Diffraction Gratings Fabricated by…

Award Information

Agency:
National Aeronautics and Space Administration
Branch:
N/A
Award ID:
71983
Program Year/Program:
2004 / SBIR
Agency Tracking Number:
034206
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
Anvik Corporation
6 Skyline Dr. Hawthorne, NY 10532 0216
View profile »
Woman-Owned: No
Minority-Owned: Yes
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 2004
Title: High-Resolution, High-Efficiency, Curved Diffraction Gratings Fabricated by Conformable, Maskless,100-nm Lithography
Agency: NASA
Contract: NNM04AA89C
Award Amount: $69,993.00
 

Abstract:

In this program, we will develop a novel process for fabricating large-area ultraviolet diffraction gratings on curved surfaces. This process is based on a unique conformable maskless projection lithography system technology that has been developed by Anvik Corporation. The UV gratings that will be fabricated using this technology would be attractive for integration into imaging spectrometers, for example, for studying the solar corona and solar emissions, and their influence on the earth environment. In this program we will identify the patterning requirements for curved UV gratiings and we will demonstrate the feasibility of fabricating gratings using conformable maskless lithography. Anvik?s conformable maskless technology offers a number of advantages compared with currently available grating fabrication techniques, most significantly, it enables the patterning of sub-micron gratings on substrates having large sags.

Principal Investigator:

Marc Klosner
Principal Investigator
9143452442
mklosner@anvik.com

Business Contact:

Zachary Cosentino
Business Official
9143452442
zcosentino@anvik.com
Small Business Information at Submission:

Anvik Corporation
6 Skyline Dr Hawthorne, NY 10532

EIN/Tax ID: 133457285
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No