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ECR-POWERED SPUTTERING TECHNIQUES FOR THE DEPOSITION OF METAL THIN FILMS…

Award Information

Agency:
National Science Foundation
Branch:
N/A
Award ID:
17273
Program Year/Program:
1992 / SBIR
Agency Tracking Number:
17273
Solicitation Year:
N/A
Solicitation Topic Code:
N/A
Solicitation Number:
N/A
Small Business Information
Applied Science And Technology
35 Cabot Road Woburn, MA 01801
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Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 1992
Title: ECR-POWERED SPUTTERING TECHNIQUES FOR THE DEPOSITION OF METAL THIN FILMS (INCLUDING SUPERCONDUCTORS)
Agency: NSF
Contract: N/A
Award Amount: $50,000.00
 

Abstract:

THIS PROJECT WOULD DEVELOP AN ECR SPUTTER SOURCE FOR METAL OXIDE THIN FILM DEPOSITION EMPLOYING SOLID METAL OXIDE TARGETS AS A MATERIAL SOURCE. IN PHASE I, YBCO WILL BE USEDAS THE SPECIFIC METAL OXIDE IN ORDER TO EVALUATE AND ELIMINATE THE EFFECTS OF FILM DAMAGE BY ENERGETIC PARTICLE BOMBARDMENT ORDINARILY SEEN IN CONVENTIONAL ON-AXIS SPUTTERING EXPERIMENTS. RECENT WORK BY ANOTHER GROUP SUGGESTS A WAY TO DEVELOP A LARGE AREA HIGH RATE ECR METAL OXIDE DEPOSITION SOURCE WHICH CAN OVERCOME PREVIOUS DIFFICULTIES WITH ON-AXIS SPUTTER MAGNETRONS. EXPERIMENTS WILL BE CARRIED OUT ON A SUITABLY MODIFIED ECR TEST STAND WHICH WILL ENABLE US TO CHARACTERIZE BOTH THE PLASMA FORMATION THROUGH MICROWAVE ECR PLASMA PRODUCTION AND THE RFSPUTTERING OF METAL OXIDE TARGETS. THE TECHNOLOGY WOULD BE COMPATIBLE WITH CURRENTLY AVAILABLE SEMICONDUCTOR TOOLS.

Principal Investigator:

Richard S. Post
President
6179335560

Business Contact:

Small Business Information at Submission:

Applied Science And Technology
35 Cabot Road Woburn, MA 01801

EIN/Tax ID:
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No