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Displaying 6451 – 6475 of 7425 Awards
Company: Sandia Systems, Inc. Agency/Program/Year/Phase: NSF / SBIR / 1992 / 1
Abstract: ION BEAM FIGURING TECHNIQUES WILL BE APPLIED TO FIGURE ASPHERE OPTICAL ELEMENTS. A MIRROR WILL BE ASPHERIZED TO REMOVE THE R(0)6 ZERNIKE CONTRIBUTION TO CORRECT FOR THIRD-ORDER AND FIFTH-ORDER SPHERICAL ABBERRATION AND DEFOCUS. IN ADDITION, A PHASE CORRECTION PLATE WITH THE SAME… more
Company: Sandia Systems, Inc. Agency/Program/Year/Phase: DOD / SBIR / 1992 / 1
Abstract: Sandia Systems, Inc. will apply novel processing techniques to demonstrate an improved fabrication process for SiC optical elements. We will combine the CVD of SiC replication process and ion beam figuring process to demonstrate fabrication of high quality optical elements. The… more
Company: SCIENCE RESEARCH LABORATORY INC Agency/Program/Year/Phase: HHS / SBIR / 1992 / 2
Abstract: THE OBJECTIVE OF THIS EFFORT IS TO DEVELOP NEW ION BEAM TARGET CHAMBER TECHNOLOGIES THAT WILL INCREASE RELIABILITY WHILE MAINTAINING HIGH YIELD CAPABILITY FOR THE PRODUCTION OF POSITRON EMISSION TOMOGRAPHY (PET) RADIOISOTOPES (O-15, N-13, C-11, F-18) OBTAINED WITH THE NEW LOWER… more
Company: SCIENCE RESEARCH LABORATORY INC Agency/Program/Year/Phase: DOE / SBIR / 1992 / 1
Abstract: … WITHIN THE CRITICAL Q=1 FLUX SURFACE. A PROMISING TECHNIQUE HAS RECENTLY BEEN EXPLORED AT THE TOKAMAK FUSION TEST REACTOR, IN WHICH CIGAR-SHAPED IMAGES OF THE ABLATION CLOUDS OF IONIZED STATES OF IMPURITY PELLETS INJECTED INTO THE PLASMA ARE OBSERVED. BECAUSE THESE IONS ARE… more
Company: Sonoma Research Company Agency/Program/Year/Phase: USDA / SBIR / 1992 / 2
Abstract: …HEMICAL REACTION O2 + 3 OH-= HO2- + 2O- + H2O THE VERY REACTIVE OXIDIZING SPECIES O.- AND HO2- WILL INDISCRIMINANTLY OXIDIZE MOST ORGANIC COMPOUNDS DISSOLVED INWATER TO SODIUM CARBONATE AND OTHER INORGANIC SALTS. CARBONCATHODES ARE KNOWN TO REDUCE OXYGEN TO HYDROPEROXIDE ION.… more
Company: Southwest Sciences, Inc. Agency/Program/Year/Phase: DOT / SBIR / 1992 / 1
Abstract: …, INC. PROPOSES A NOVEL MASS SPECTROMETRIC METHOD, * IONIZATION ENERGY MODULATED MASS SPECTROMETRY (IEMMS), FOR THE RAPID DETECTION OF VAPORS FROM EXPLOSIVES, INCENDIARIES AND NOXIOUS GASES. IEMMS COMBINES ELECTRON IMPACT IONIZATION USING A MONOCHROMATIC ELECTRON BEAM WITH … more
Company: Sparta, Inc. Agency/Program/Year/Phase: DOD / SBIR / 1992 / 2
Abstract: … COUNTERMEASURES (EOCM) ARE REQUIRED TO OPERATE WITHIN SOME SPECTRAL BANDWIDTH TO DEFEAT POTENTIAL THREATS. MOT EOCM DEVICES RELY UPON BROADBAND BLACKBODY EMITTERS THAT LACK SPECTRAL SELECTIVITY. WHEN A PLASMA DISCHARGE OCURRS ON A SURFACE, SOME OF THE IONS FROM THE… more
Company: SPIRE CORPORATION Agency/Program/Year/Phase: NSF / SBIR / 1992 / 2
Abstract: THIS INVESTIGATION WILL STUDY SUPERPLASTICITY OF CERAMIC COATINGS PRODUCED BY ION ASSISTED DEPOSITION, AND WILL DETERMINE THE UTILITY OF SUCH FILMS AS DUCTILE OVERCOATS ON METAL SUBSTRATES. ION ASSISTED DEPOSITION COMBINES PHYSICALVAPOR DEPOSITION OF AN EVAPORANT WITH LOW ENERGY… more
Company: SPIRE CORPORATION Agency/Program/Year/Phase: NSF / SBIR / 1992 / 2
Abstract: … INTERCONNECTS. WE SHALL INVESTIGATE A NOVEL, THREE-DIMENSIONAL, SILICON-ON-INSULATOR (SOI) GUIDED-WAVE STRUCTURE THAT WILL ALLOW OPTICAL COMMUNICATIONS ON TWO STACKED LEVELS WITHIN A LARGE-AREA SILICON WAFER. TO DO THIS WE SHALL USE MULTIPLE IMPLANTS OF OXYGEN IONS BASED ON… more
Company: SPIRE CORPORATION Agency/Program/Year/Phase: DOE / SBIR / 1992 / 1
Abstract: … GRAIN BOUNDARIES AND CAN BE DEPOSITED AT LOWER TEMPERATURES THAN PURE SILICON, ARE EXPECTED TO BE SUPERIOR TO POLYCRYSTALLINE OR AMORPHOUS SILICON FOR TFTS AND COULD MEET THE SSC REQUIREMENTS. LOW TEMPERATURE CHEMICAL VAPOR DEPOSITION OF THIN FILMS WILL BE FOLLOWED BY ION… more
Company: SPIRE CORPORATION Agency/Program/Year/Phase: NSF / SBIR / 1992 / 1
Abstract: … (PHOTOLUMINESCENCE), OR WHEN IMMERSED IN AN H2O:NAC1 ELECTROLYTE UNDER AN ELECTRIC FIELD, THE TREATED SAMPLES EMITTED VERY BRIGHT RED LIGHT. MOREOVER, WE DEMONSTRATED THAT IT IS POSSIBLE TO TAILOR THE EMISSION SPECTRUM BY ANODIZING SI-BASED ALLOYS SUCH AS SI1-XGEX OR ION… more
Company: SPIRE CORPORATION Agency/Program/Year/Phase: NSF / SBIR / 1992 / 1
Abstract: … GROWN BY MOLECULAR BEAM EPITAXY (MBE) CAN RESULT IN MANY PERFORMANCE IMPROVEMENTS, INCLUDING ELIMINATION OF BACKGATING. BECAUSE OF ITS VERY HIGH PROCESSING COST, MBE IS NOT A COMMERCIALLY VIABLE PRODUCTIONMETHOD. WE PROPOSE TO FORM AN EFFECTIVE BUFFER LAYER USING ION… more
Company: SPIRE CORPORATION Agency/Program/Year/Phase: NSF / SBIR / 1992 / 1
Abstract: … DIAMOND PARTICLES CAN BE USED TO IMPROVE THE FILMS, BUT THE POLISHING PROCESS IS LONG AND EXPENSIVE, AND DOES NOT PRODUCE IDEAL RESULTS. FURTHERMORE, DURING MECHANICAL POLISHING, GRAINS IN THE FILM FREQUENTLY BECOME DISLODGED, EXTENDING THE NECESSARY POLISHING TIME. ION… more
Company: SPIRE CORPORATION Agency/Program/Year/Phase: DOD / SBIR / 1992 / 1
Abstract: … BEAM EXPITAXY (MBE) CAN RESULT IN MANY PERFORMANCE IMPROVEMENTS, INCLUDING ELIMINATION OF BACKGATING. ONE OF THE DOMINANT CHARACTERISTICS OF THE MBE-GROWN BUFFER LAYERS IS AN EXCESS OF AS IN THE FILM. WE PROPOSE THE FORMATION OF AS-RICH BUFFER LAYERS BY ION IMPLANTATION… more
Company: SPIRE CORPORATION Agency/Program/Year/Phase: DOD / SBIR / 1992 / 1
Abstract: SPIRE PROPOSES TO DEVELOP A SEQUENCE OF ADVANCED DEPOSITION AND PROCESSING TECHNIQUES FOR CREATING SUPERIOR NITRIDE SEMICONDUCTOR FILMS (ALLOYS OF A1N, GAN, AND INN) SUITABLE FOR PRODUCING FULL COLOR, FLAT TARGETED AT NITRIDES, DEPLOY ION IMPLANTATION TO INTRODUCE P-TYPE DOPANTS… more
Company: SPIRE CORPORATION Agency/Program/Year/Phase: HHS / SBIR / 1992 / 1
Abstract: …, WHEREAS A TIP WIDTH OF LESS THAN 0.5 MICRONS IS DESIRABLE. ANOTHER PROBLEM IS THAT THE NON-REPEATABILITY OF THE POLISHING PROCESS CAUSES VARIATION IN BLADE SHARPNESS FROM BLADE-TO-BLADE AND FROM LOT-TO-LOT. WE HOPE TO DEVELOP A NOVEL METHOD OF POLISHING DIAMONDS, ION BEAM… more
Company: SPIRE CORPORATION Agency/Program/Year/Phase: DOD / SBIR / 1992 / 1
Abstract: …, heat transfer in these devices improves as capillary sizes shrink, but they cannot be arbitrary reduced without eventually causing blockages and catastrophic hot spots. Instead, Spire proposes to keep the larger passages but micro-texture inner surfaces by ion beams to… more
Company: SPIRE CORPORATION Agency/Program/Year/Phase: HHS / SBIR / 1992 / 1
Abstract: …, AND EVENTUALLY AFFECTING THE MECAHNICAL STABILITY OF THE WOVEN TITANIUM WIRE. PHASE I RESEARCH WILL INVESTIGAGE THE DEVELOPMENT OF LOW-IMPEDANCE, PLATINUM METALLIZED POLYMER TO SAFELY AND EFFECTIVELY DEFILBRILLATE HEART TISSUE. SILICONE RUBBER PATCHES WILL BE ION BEAM… more
Company: SPIRE CORPORATION Agency/Program/Year/Phase: HHS / SBIR / 1992 / 1
Abstract: …VELOP ENERGY-DENSE LONG-LIVED IMPLANTABLE POWER SOURCES RANGING FROM MICROWATTS TO SEVERAL WATTS. THE CORE OF THE DEVICE IS RADIOISOTOPE-POWERED INDIUM PHOSPHIDE VOLTAIC CELL EXPECTED TO ACHIEVE ENERGY DENSITIES OVER TEN THOUSAND TIMES THAT OF THE BEST CHEMICAL BATTERIES. THE… more
Company: SPIRE CORPORATION Agency/Program/Year/Phase: HHS / SBIR / 1992 / 1
Abstract: … IN A LABORIOUS, TIME CONSUMING SERIES OF MANUAL OPERATIONS WHOSE OUTPUT IS SMALL AND WHOSE PRODUCT IS UNRELIABLE; TO FULLY REALIZE THE BENEFITS OF CWRU'S INNOVATION, AN IMPROVED, MASS-PRODUCIBLE VERSION MUST BE DEVELOPED. SUCH AN ELECTRODE IS THE SUBJECT OF THIS PROJECT. … more
Company: SPIRE CORPORATION Agency/Program/Year/Phase: HHS / SBIR / 1992 / 1
Abstract: ION BEAM ASSISTED DEPOSITION (IBAD) WILL BE USED AS A METHOD OF PRODUCING A THIN, ULTRA-LOW (
Company: SPIRE CORPORATION Agency/Program/Year/Phase: DOD / SBIR / 1992 / 1
Abstract: N/A
Company: SPIRE CORPORATION Agency/Program/Year/Phase: DOD / SBIR / 1992 / 1
Abstract: N/A
Company: Srico Optical Engineering Agency/Program/Year/Phase: DOD / SBIR / 1992 / 2
Abstract: … TO BE MORE ACCURATE THAN A CONVENTIONAL DEVICE DUE TO THE ABSENCE OF ANY METAL ELECTRODES THAT TEND TO DISTURB THE FIELDS. THE KEY TO THE PROPOSED EFFORT IS THE TECHNIQUE OF SELECTIVELY REVERSE POLING A CHANNEL WAVEGUIDE SECTION IN THE CRYSTAL MATERIAL, LITHIUM NIOBATE,… more
Company: Surfactant Assoc Inc. Agency/Program/Year/Phase: NSF / SBIR / 1992 / 1
Abstract: … COMPETITIVENESS. ALSO, FIRMS SPECIALIZING IN HAZARDOUS WASTE DISPOSAL AND POLLUTION CONTROL WILL BE A MAJOR AREA OF INDUSTRIAL GROWTH IN THE US. MICELLAR-ENHANCED ULTRAFILTRATION (MEUF) IS A NEW PROCESS WHICH CAN REMOVE DISSOLVED ORGANICS AND MULTIVALENT METAL IONS FROM… more
Displaying 6451 – 6475 of 7425 Awards
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