You are here

Nanoscale X-Y Stage for Precision Lithography

Award Information
Agency: Department of Defense
Branch: Defense Advanced Research Projects Agency
Contract: N/A
Agency Tracking Number: 36499
Amount: $99,000.00
Phase: Phase I
Program: SBIR
Solicitation Topic Code: N/A
Solicitation Number: N/A
Solicitation Year: N/A
Award Year: 1997
Award Start Date (Proposal Award Date): N/A
Award End Date (Contract End Date): N/A
Small Business Information
2401 21st Ave S., Suite 102
Nashville, TN 37212
United States
HUBZone Owned: No
Woman Owned: No
Socially and Economically Disadvantaged: No
Principal Investigator
 Lowell Jones
 (615) 292-7022
Business Contact
Phone: () -
Research Institution

The state-of-the-art in the microelectronics industry is being pushed primarily by two motivations: the demand for more circuitry etched per unit area and the demand for higher throughput. Both of these needs can be met by an increase in the speed and/or the resolution of lithography positioning equipment. Proposed herein is an innovative X-Y stage design through which control of positions on the order of nanometers will be attempted while simultaneously increasing stroke length to 300 mm per axis, maximum speed to 1 m/s, and turnaround time to under 100 ms. The proposed design will utilize a macro-micro positioning approach analogous to an audio "woofer-tweeter" arrangement for each axis of the stage. This approach will allow for a decoupling of the positioners coarse and fine motion properties simplifying components and design of the entire system.

* Information listed above is at the time of submission. *

US Flag An Official Website of the United States Government