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Protein Crystals as Patterning Elements for Nanostructured Optoelectronic Materials

Award Information
Agency: Department of Defense
Branch: Army
Contract: N/A
Agency Tracking Number: 28753
Amount: $70,000.00
Phase: Phase I
Program: SBIR
Solicitation Topic Code: N/A
Solicitation Number: N/A
Solicitation Year: N/A
Award Year: 1995
Award Start Date (Proposal Award Date): N/A
Award End Date (Contract End Date): N/A
Small Business Information
2386 Vassar Drive
Boulder, CO 80303
United States
HUBZone Owned: No
Woman Owned: No
Socially and Economically Disadvantaged: No
Principal Investigator
 Jacques Pankove
 (303) 492-5470
Business Contact
Phone: () -
Research Institution

We propose to develop a new technology for the parallel nanostructuring of optoelectronic materials. It calls for the molecular self-assembly of protein masks on a surface which has been primed with SAMs (self-assembled monolayers) which themselves have been modified, in a parallel process, by deep UV radiation. After the protein masks have been self-assembled, the process of "parallel nanometer molecular lithography" provides an entirely parallel methodology for the transfer of the nanometer-scale pattern of the mask to the substrate surface. The subsequent application of LE4 (low energy electron enhanced etching) to impress a deeper nanostructuring into the substrate material is a parallel process as well. The successful demonstration of electroluminescence from quantum dot arrays of crystalline silicon nanofabricated by the proposed techniques would provide the first advanced-concept material derived from this highly innovative approach.

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