You are here

High Hesitivity Magnetic Materials for Magnetic Toroid and Flat Dipole Antennas

Award Information
Agency: Department of Defense
Branch: Navy
Contract: N68335-16-C-0228
Agency Tracking Number: N16A-001-0025
Amount: $80,000.00
Phase: Phase I
Program: STTR
Solicitation Topic Code: N16A-T001
Solicitation Number: 2016.0
Timeline
Solicitation Year: 2016
Award Year: 2016
Award Start Date (Proposal Award Date): 2016-05-20
Award End Date (Contract End Date): 2016-12-30
Small Business Information
21 Churchill Rd
Winchester, MA 01890
United States
DUNS: 829501225
HUBZone Owned: No
Woman Owned: Yes
Socially and Economically Disadvantaged: No
Principal Investigator
 Yuan (Daniel) Gao
 (617) 909-0158
 dan@winchestertech.org
Business Contact
 Hui Lu
Phone: (781) 369-1553
Email: info@winchestertech.org
Research Institution
 Northeastern University
 Tony Rufo
 
360 Huntington Avenue
Boston, MA 02115
United States

 (617) 373-2389
 Nonprofit College or University
Abstract

Novel approaches are needed to improve the performance and reduce the size, number and signature of antennas with significantly enhanced efficiency in HF-UHF. It has been shown recently hesitivity, which is able to characterize the performance of the material and categorize the radiation efficiency of magnetodielectric wire antennas; the higher the hesitivity, the higher the attainable antenna efficiency over the frequency range. Further hesitivity improvement by 10 over state of the art is required for magnetic films on ultra-thin carrier substrates since much higher antennas efficiencies are greatly desired. Based on their extensive expertise on RF magnetic film materials and devices, the principal investigators propose to develop a good understanding of hesitivity and bring up the relationship between hesitivity and the well-known magnetic material parameters. Then the PIs will demonstrate new candidate magnetic films with 10 higher hesitivities (5~10107 O/m) on ultra-thin SiO2 carrier films (<10 nm) through sputtering of high quality magnetic/dielectric multilayer films on oxidized Si substrates, and deep reactive ion etch for removing the Si substrates. These proposed magnetic materials with much higher hesitivities on ultra-thin SiO2 carrier films will be applied to wide-band low-profile magnetic toroid and flat dipole antennas with much higher radiation efficiency.

* Information listed above is at the time of submission. *

US Flag An Official Website of the United States Government