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Processes for Fabrication of Atomically Precise Strongly Correlated Materials

Award Information
Agency: Department of Defense
Branch: Defense Advanced Research Projects Agency
Contract: 140D6318C0087
Agency Tracking Number: D17C-002-0006
Amount: $229,930.00
Phase: Phase I
Program: STTR
Solicitation Topic Code: ST17C-002
Solicitation Number: 17.C
Timeline
Solicitation Year: 2017
Award Year: 2018
Award Start Date (Proposal Award Date): 2018-07-16
Award End Date (Contract End Date): 2019-12-15
Small Business Information
95 Brown Road M/S 1035
Ithaca, NY 14850
United States
DUNS: 079136589
HUBZone Owned: No
Woman Owned: No
Socially and Economically Disadvantaged: No
Principal Investigator
 Kwame Amponsah
 CEO & Founder
 (607) 262-0515
 kwame.amponsah@xallent.com
Business Contact
 Kwame Amponsah
Phone: (607) 262-0515
Email: kwame.amponsah@xallent.com
Research Institution
 Cornell University
 Darrell Schlom, Ph.D. Darrell Schlom, Ph.D.
 
395 Pine Tree Rd Suite 330
Ithaca, NY 14850
United States

 (607) 255-6504
 Nonprofit College or University
Abstract

Developing knowledge-driven nanoelectronics for military applications requires understanding the fundamental physics that governs the behavior of the underlying materials. Strongly correlated materials have very desirable properties such as interfacial superconductivity, ferroelectricity, ferromagnetism, and huge magnetoresistance, which make them an ideal set of candidates to integrate with semiconductor materials as device dimensions approach the atomic scale. These materials achieve their superb properties via electron-electron and electron-lattice interactions and have the potential to find military applications in the fields of supercomputing, memory, imaging and energy generation. However, since the physical, electrical and chemical phenomena underlying the operation of such materials occur at the nanoscale level, they require spatially and temporally resolved localized studies. Thus, the continued development of novel devices and materials geared toward such military oriented applications must involve extensive probing and characterization. The proposed nanomachine technology leverages powerful nano-electro-mechanical capabilities to perform tip-based nanofabrication, imaging, and testing of thin film materials and semiconductor devices. Research project objectives include synthesis of atomically precise strongly correlated thin films, fabrication of a nanomachine probe, and assembly of a nanomachine probe station. The outcome of this project will result in the fabrication of atomically precise strongly correlated nanowires with sub-10 nanometer critical dimensions.

* Information listed above is at the time of submission. *

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