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Aberration-correcting Topologically Optimized Metasurface (ATOM)

Award Information
Agency: Department of Defense
Branch: Defense Advanced Research Projects Agency
Contract: 140D0420C0065
Agency Tracking Number: DHR001119S0035-24-0007
Amount: $224,944.00
Phase: Phase I
Program: STTR
Solicitation Topic Code: HR001119S0035-24
Solicitation Number: DARPA HR001119S0035-24
Timeline
Solicitation Year: 2019
Award Year: 2020
Award Start Date (Proposal Award Date): 2020-02-10
Award End Date (Contract End Date): 2020-09-09
Small Business Information
20 New England Business Center
Andover, MA 01810
United States
DUNS: 073800062
HUBZone Owned: No
Woman Owned: No
Socially and Economically Disadvantaged: No
Principal Investigator
 David N Woolf
 Principal Research Scientist
 (978) 689-0003
 dwoolf@psicorp.com
Business Contact
 David Weatherby
Phone: (978) 738-8107
Email: weatherby@psicorp.com
Research Institution
 Stanford University
 Ian N. Whyburn Ian N. Whyburn
 
Office of Sponsored Research 485 Broadway, 3rd Floor
Redwood City, CA 94063
United States

 (650) 497-1968
 Nonprofit college or university
Abstract

Metalenses, with their ability to arbitrarily control the amplitude and phase of light across a band of wavelengths, have the potential to disrupt imaging and communication systems which rely on traditional lenses to focus, collimate, and otherwise manipulate optical signals, and are under increasing pressure to operate with reduced size and weight. We propose to design, develop, and demonstrate an aberration-correcting topologically optimized metasurface (ATOM) that can reduce the number of optical elements in an imaging system, contributing to a significant savings in size and weight. The metasurface will be part of a broadband (400-700 nm) f/2 imaging system that can be fabricated in sizes up to 100 mm diameter. Our approach to producing such a low size-weight and power (SWaP) optical system will utilize an aberration correcting metasurface hybridized with conventional lenses to reduce the focusing power demanded of the metasurface, use topological optimization to generate a library of meta-elements for the metasurface, and utilize nano-imprint lithography to reduce the cost of the metacorrector when produced at large volumes.

* Information listed above is at the time of submission. *

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