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Integrated Micro-Supercapacitors via Laser Induced Graphene from Photoresist

Award Information
Agency: Department of Defense
Branch: Defense Microelectronics Activity
Contract: HQ072721P0031
Agency Tracking Number: E21A-001-0015
Amount: $167,488.21
Phase: Phase I
Program: STTR
Solicitation Topic Code: DMEA21A-001
Solicitation Number: 21.A
Timeline
Solicitation Year: 2021
Award Year: 2021
Award Start Date (Proposal Award Date): 2021-08-05
Award End Date (Contract End Date): 2022-02-09
Small Business Information
510 Earl Boulevard
Miamisburg, OH 45342-1111
United States
DUNS: 130020209
HUBZone Owned: No
Woman Owned: No
Socially and Economically Disadvantaged: No
Principal Investigator
 John Hondred
 (937) 320-1877
 hondredja@crgrp.com
Business Contact
 Jackie Luce
Phone: (937) 320-1877
Email: lucej@crgrp.com
Research Institution
 Kansas State Univeristy
 Anita Fahrny
 
2 Fairchild Hall, 1601 Vattier Street
Manhattan, KS 66506-1103
United States

 (785) 532-6804
 Nonprofit College or University
Abstract

While supercapacitors have been demonstrated for decades, the biggest challenge is to develop a reliable fabrication strategy which can integrate these devices with current CMOS (complementary metal oxide semiconductor) technology. Current fabrication technologies do not have good compatibility with other electronic components or cannot manufacture the supercapacitor in a small form factor. Consequently, most supercapacitor are developed on an isolated chip and then soldiered onto the electronic board. This method adds significant weight, large aerial footprint, and significantly fabrication cost and labor. Therefore, a supercapacitor design and manufacturing method needs to be developed that directly integrate miniature supercapacitors on-chip and which is compatible with current CMOS technology.

* Information listed above is at the time of submission. *

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