Integrated Micro-Supercapacitors via Laser Induced Graphene from Photoresist

While supercapacitors have been demonstrated for decades, the biggest challenge is to develop a reliable fabrication strategy which can integrate these devices with current CMOS (complementary metal oxide semiconductor) technology. Current fabrication technologies do not have good compatibility with other electronic components or cannot manufacture the supercapacitor in a small form factor. Consequently, most supercapacitor are developed on an isolated chip and then soldiered onto the electronic board. This method adds significant weight, large aerial footprint, and significantly fabrication cost and labor. Therefore, a supercapacitor design and manufacturing method needs to be developed that directly integrate miniature supercapacitors on-chip and which is compatible with current CMOS technology.