High Speed, High Accuracy Stage for Advanced Lithography

Award Information

Agency: Department of Defense

Branch: Defense Advanced Research Projects Agency

Contract: N/A

Agency Tracking Number: 36506

Amount: $98,906.00

Phase: Phase I

Program: SBIR

Solicitation Topic Code: N/A

Solicitation Number: N/A

Timeline

Solicitation Year: N/A

Award Year: 1997

Award Start Date (Proposal Award Date): N/A

Award End Date (Contract End Date): N/A

Small Business Information

Optra, Inc.

461 Boston St.

Topsfield, MA 01983

United States

DUNS: N/A

HUBZone Owned: No

Woman Owned: No

Socially and Economically Disadvantaged: No

Principal Investigator

Name: Michael Hercher
Phone: (508) 887-6600

Business Contact

Phone: () -

Research Institution

N/A

Abstract

The development of a high-speed, very accurate XY stage for semiconductor lithography is proposed. Key features are: a grid-based metrology system which is immune to turbulence and has subnanometer resolution; a high-speed, light-weight XY stage capable of supporting 12" wafers, and including active control of all six degrees of freedom; and dual-loop servo systems for X and Y to provide fast long-range moves and highly accurate short-range positioning. If successful, this approach will provide all of the capabilities needed for the next generation of steppers for high throughput, high accuracy microlithography. This approach also promises to reduce the cost of the metrology system by at least a factor of two relative to the cost of a comparable, but less capable, laser interferometer system.

* Information listed above is at the time of submission. *

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High Speed, High Accuracy Stage for Advanced Lithography