Continuously Variable Attenuated-Phase-Shifted Photomask for Integrated Spectroscopic Sensor Platforms enabled by Optical Nanolithography

Redondo Optics Inc. (ROI), a world leader in engineering and manufacturing of leading-edge nano-materials, optical sensors, fiber and integrated optics, and advanced photonics instrumentation proposes to develop and demonstrate for the first time the concept of an etch-less, deep-UV, fully continuously variable attenuated-phase-shifted mask (ConvaPSM™) technology to enable ultra-high resolution, optical nanolithography techniques for the cost effective production of integrated terahertz-frequency spectroscopic chemical and biological sensor platforms. The ConvaPSM™ technology can be produced on quartz, fluorinated quartz, or calcium fluoride substrates to produce a continuously variable attenuated-phase-shifted photomask that allows the lithographic production of ?100-nm features using conventional contact or projection aligners or state-of-the-art interferometric lithography (IL), interferometric imaging lithography (IIL), or liquid immersion lithography (LIL) systems. This proposal addresses the problem of facilitating a higher resolution and higher throughput capability by improving the structure of phase-shift masks used to produce biological and chemical integrated spectroscopic sensor platforms using next generation nanolithography techniques. The ConvaPSM™ technology will readily find uses in the military, government, and commercial sectors for applications in nanoelectronics, photonics, molecular electronics, spintronic, microfluidic, or nano-mechanical (NEMS) technologies.