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Continuously Variable Attenuated-Phase-Shifted Photomask for Integrated Spectroscopic Sensor Platforms enabled by Optical Nanolithography

Award Information
Agency: Department of Defense
Branch: Office for Chemical and Biological Defense
Contract: W911NF-05-C-0064
Agency Tracking Number: C051-107-0104
Amount: $98,231.00
Phase: Phase I
Program: SBIR
Solicitation Topic Code: CBD05-107
Solicitation Number: 2005.1
Solicitation Year: 2005
Award Year: 2005
Award Start Date (Proposal Award Date): 2005-05-13
Award End Date (Contract End Date): 2005-11-30
Small Business Information
2803 Faber Street
Redondo Beach, CA 90278
United States
DUNS: 117943451
HUBZone Owned: No
Woman Owned: No
Socially and Economically Disadvantaged: No
Principal Investigator
 Edgar Mendoza
 Chief Excutive Officer
 (310) 292-7673
Business Contact
 Edgar Mendoza
Title: Chief Excutive Officer
Phone: (310) 292-7673
Research Institution

Redondo Optics Inc. (ROI), a world leader in engineering and manufacturing of leading-edge nano-materials, optical sensors, fiber and integrated optics, and advanced photonics instrumentation proposes to develop and demonstrate for the first time the concept of an etch-less, deep-UV, fully continuously variable attenuated-phase-shifted mask (ConvaPSMT) technology to enable ultra-high resolution, optical nanolithography techniques for the cost effective production of integrated terahertz-frequency spectroscopic chemical and biological sensor platforms. The ConvaPSMT technology can be produced on quartz, fluorinated quartz, or calcium fluoride substrates to produce a continuously variable attenuated-phase-shifted photomask that allows the lithographic production of ?100-nm features using conventional contact or projection aligners or state-of-the-art interferometric lithography (IL), interferometric imaging lithography (IIL), or liquid immersion lithography (LIL) systems. This proposal addresses the problem of facilitating a higher resolution and higher throughput capability by improving the structure of phase-shift masks used to produce biological and chemical integrated spectroscopic sensor platforms using next generation nanolithography techniques. The ConvaPSMT technology will readily find uses in the military, government, and commercial sectors for applications in nanoelectronics, photonics, molecular electronics, spintronic, microfluidic, or nano-mechanical (NEMS) technologies.

* Information listed above is at the time of submission. *

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