CMR Oxides Based Microbolometer Focal Plane Array with Reduced 1/f Noise

We propose to realize a new class of microbolometer FPA technology with significantly reduced 1/f noise by replacing the sensing material (e.g. VOx) with colossal magnetoresistive (CMR) oxides. The program uniquely combines Agiltron’s experience in novel IR imager development and leading academic research on CMR at Los Alamos National Lab (LANL). The LANL Team has developed breakthrough processing technique for CMR film deposition. Agiltron will further advance LANL’s CMR film fabrication techniques and develop a film transfer technology, allowing formation of microbolometers on top of CMOS circuitry as practiced in current technology. We anticipate reducing the NETD of state of the art bolometers based on VOx and amorphous silicon from 29 mK to 12 mK. Functional microbolometers based on CMR oxides and a performance comparison with state of the art devices will be produced in Phase II.