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Producibility of Gallium Nitride Semiconductor Materials

Award Information
Agency: Department of Defense
Branch: Missile Defense Agency
Contract: HQ0006-10-C-7398
Agency Tracking Number: B09B-001-0032
Amount: $100,000.00
Phase: Phase I
Program: STTR
Solicitation Topic Code: MDA09-T001
Solicitation Number: 2009.B
Timeline
Solicitation Year: 2009
Award Year: 2010
Award Start Date (Proposal Award Date): 2010-05-03
Award End Date (Contract End Date): 2010-11-02
Small Business Information
5385 Hollister Ave. #113
Santa Barbara, CA 93111
United States
DUNS: 199434338
HUBZone Owned: No
Woman Owned: No
Socially and Economically Disadvantaged: No
Principal Investigator
 Paul Fini
 Chief Technology Officer
 (805) 504-4639
 fini@inlustra.com
Business Contact
 Benjamin Haskell
Title: Chief Executive Officer
Phone: (805) 504-4639
Email: bhaskell@inlustra.com
Research Institution
 University of Notre Dame
 Shanda Wirt
 
511 Main Building Office of Research
Notre Dame, IN 46556
United States

 (574) 631-8710
 Nonprofit College or University
Abstract

Inlustra Technologies and the University of Notre Dame propose a Phase I STTR program that, combined with a subsequent Phase II effort, will result in methods for the scalable production of semi-insulating non-polar GaN substrates. These substrates will be utilized in the fabrication of high-power/high-frequency AlGaN-GaN electronic devices capable of reliable operation under high thermal load. In Phase I, Inlustra will demonstrate the feasibility of reproducible doping conditions needed for the growth of semi-insulating non-polar (a-plane and m-plane) GaN boules. Concurrently, Notre Dame will perform detailed electrical characterization (for example, temperature-dependent Hall measurements) of Inlustra’s semi-insulating GaN material. These measurements will provide frequent feedback required for Inlustra’s GaN boule growth effort. The proposed program will lay a solid foundation for further work in Phase II, focusing on commercially practical growth of semi-insulating GaN boules and benefits for (Al,Ga)N high-power/high-frequency devices.

* Information listed above is at the time of submission. *

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