The Award database is continually updated throughout the year. As a result, data for FY19 is not expected to be complete until April, 2020.
SBC: Jordan Valley Semiconductors, Inc. Topic: N/A
A semiconductor metrology tool will be developed employing the technique of small-angle x-ray scattering (SAXS) to measure the critical dimension (CD) of patterned device structures. The feasibility of the SAXS technique to measure CD has been shown using high-power synchrotron radiation facilities which are not of practical use to the semiconductor industry. The ultimate project goal is to produc ...SBIR Phase I 2004 Department of CommerceNational Institute of Standards and Technology
SBC: XIDEX CORPORATION Topic: N/A
Xidex proposes to demonstrate the feasibility of calibrating a critical-dimension atomic force microscope (CD-AFM) without the use of a reference artifact in such a way that high-precision critical dimensions can be generated independently of changes in probe tip shape. We plan to demonstrate sub-nanometer repeatability for tip-to-tip calibration, and demonstrate single-point critical-dimension me ...SBIR Phase II 2004 Department of CommerceNational Institute of Standards and Technology