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The Award database is continually updated throughout the year. As a result, data for FY19 is not expected to be complete until April, 2020.

  1. Development of a Laboratory Scale CD-SAXS Device for Semiconductor Metrology Applications

    SBC: Jordan Valley Semiconductors, Inc.            Topic: N/A

    A semiconductor metrology tool will be developed employing the technique of small-angle x-ray scattering (SAXS) to measure the critical dimension (CD) of patterned device structures. The feasibility of the SAXS technique to measure CD has been shown using high-power synchrotron radiation facilities which are not of practical use to the semiconductor industry. The ultimate project goal is to produc ...

    SBIR Phase I 2004 Department of CommerceNational Institute of Standards and Technology
  2. Dual-Probe CD-AFM Calibration

    SBC: XIDEX CORPORATION            Topic: N/A

    Xidex proposes to demonstrate the feasibility of calibrating a critical-dimension atomic force microscope (CD-AFM) without the use of a reference artifact in such a way that high-precision critical dimensions can be generated independently of changes in probe tip shape. We plan to demonstrate sub-nanometer repeatability for tip-to-tip calibration, and demonstrate single-point critical-dimension me ...

    SBIR Phase II 2004 Department of CommerceNational Institute of Standards and Technology

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