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CHROMEX proposes to develop a monitor system for plasma etch reactors that will, in the Phase I program, demonstrate much improved endpoint detection when compared to currently availabe systems. The Phase II research will extend the monitoring capabilities to all important plasma parameters. The system will provide the feedback information to the reactor controller necessary to produce a flexible ...

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DARPA has identified collaborative computing as a technology not yet adequately developed in the marketplace. This need to share and interactively work with documents and other information objects across separate computer systems is really the underlying human business need that originally drove the creation of network technology, desktop video-teleconferencing, and even the failed earlier indust ...

This SBIR will explore and develop new automated methods for dynamic fault tolerance in defense electronic systems. The research will investigate using the software of digital signal processor operating systems to pro-actively map defective operations to remaining processors. In the past, fault tolerance has relied on passive redundancy to extend operating life. With software, a simple re-start ...

This proposal is to design a standard collaborative tool that will link together geographically separated experts at specialized workstations with disparate data, source materials, algorithms and domain knowledge, for the purpose of creating geospecific virtual worlds. The proposed standard collaborative tools will be based on the proven functionality of the Multi-dimensional, user-oriented Synth ...

For environmental monitoring there is a need for high resolution mapping of flow channels in shallow (upper 100 ft) formations to detect contaminants a pollutants associated with underground fluid flow. To achieve this goal, effective sensing technologies and high resolution sensor processing techniques need to be developed. The objective of this project is to develop a new acoustic logging tool t ...

We will demonstrate the capability of scatterometry to provide a process monitor to post exposure bake of chemically amplified photoresist. Two or more scatterometers will be designed that are capable of monitoring the intensities of multiple diffraction orders that result from illuminating device patterns of photoresist. The goal is to demonstrate the capability of scatterometry to provide a PEB ...

A significant problem in precision manufacturing of large parts/assemblies is the requirement to make measurements over the surfacesof these parts for a variety of reasons including inspection/quality control; control of surfacing operations such as coatings, abrasive erosion, buffing, and texturing; and generation of "as built" documentation. A specific instance of this class of problem has been ...

Tetra Corporation proposes to investigate an innovative treatement process for the combined removal of metallic ions and the destruction of volatile organic chemicals in waste water. Both metal ion and volatile organic contaminants are commonly found in water. Tetra Corporation would thus propose to investigate the removal of metal ions and the destruction of volatile organic chemicals from contam ...