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Award Data
The Award database is continually updated throughout the year. As a result, data for FY24 is not expected to be complete until March, 2025.
Download all SBIR.gov award data either with award abstracts (290MB)
or without award abstracts (65MB).
A data dictionary and additional information is located on the Data Resource Page. Files are refreshed monthly.
The SBIR.gov award data files now contain the required fields to calculate award timeliness for individual awards or for an agency or branch. Additional information on calculating award timeliness is available on the Data Resource Page.
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N/A
SBC: EIC LABORATORIES, INC. Topic: N/AN/A
SBIR Phase I 2000 Department of DefenseOffice for Chemical and Biological Defense -
N/A
SBC: Entropic Systems, Inc. Topic: N/AN/A
SBIR Phase I 2000 Department of DefenseOffice for Chemical and Biological Defense -
Extrusion Cast Cost Effective Chemical Protective
SBC: Federal-Fabrics-Fibers, Inc. Topic: N/AN/A
SBIR Phase II 2000 Department of DefenseOffice for Chemical and Biological Defense -
N/A
SBC: ICET, INC Topic: N/AN/A
SBIR Phase I 2000 Department of DefenseOffice for Chemical and Biological Defense -
N/A
SBC: Mattek Corporation Topic: N/AN/A
SBIR Phase I 2000 Department of DefenseOffice for Chemical and Biological Defense -
Infrared Standoff Bio-Agent Discrimination
SBC: PHYSICAL SCIENCES INC. Topic: N/AN/A
SBIR Phase II 2000 Department of DefenseOffice for Chemical and Biological Defense -
N/A
SBC: PHYSICAL SCIENCES INC. Topic: N/AN/A
SBIR Phase I 2000 Department of Commerce -
N/A
SBC: Q-PEAK INCORPORATED Topic: N/AN/A
SBIR Phase I 2000 Department of DefenseOffice for Chemical and Biological Defense -
N/A
SBC: YANKEE ENVIRONMENTAL SYSTEMS, INC. Topic: N/AN/A
SBIR Phase I 2000 Department of Commerce -
NANOMETER-SIZE STEP HEIGHT TEST STRUCTURES
SBC: Advanced Technologies/Laboratories Intl Topic: N/AMCNC PROPOSES A FEASIBILITY STUDY AND EVALUATION OF THREE PROMISING APPROACHES TO THE FABRICATION OF SURFACE TEST STRUCTURES ON SILICON. SURFACE FEATURES ON THE FIRST STRUCTURE WILL BE PRODUCED BY CONTROLLABLY ETCHING THERMALLYGROWN OXIDES. FEATURES ON THE SECOND WILL BE MADE BY ETCHING PIEZOELECTRIC THIN FILMS. USING THE PIEZOELECTRIC FILM AS PART OF A CAPACITOR, STEP-HEIGHT CAN BE VARIED AND PRO ...
SBIR Phase I 1992 Department of Commerce