You are here

Award Data

For best search results, use the search terms first and then apply the filters
Reset

The Award database is continually updated throughout the year. As a result, data for FY24 is not expected to be complete until March, 2025.

Download all SBIR.gov award data either with award abstracts (290MB) or without award abstracts (65MB). A data dictionary and additional information is located on the Data Resource Page. Files are refreshed monthly.

The SBIR.gov award data files now contain the required fields to calculate award timeliness for individual awards or for an agency or branch. Additional information on calculating award timeliness is available on the Data Resource Page.

  1. Gap-Free Model-Based Engineering for Manufacturing and Analysis: Digital Thread without Translation

    SBC: Nvariate, Inc.            Topic: None

    Modern Model-Based Enterprise / Engineering (MBE) systems rely on freeform surfaces built as complex combinations of geometric primitives to define engineered objects. Unfortunately, the intersection of freeform surfaces in MBE applications results in highly approximated solutions, degrading models that cost billions annually by US industry to fix. Current technology limits the abilities of users ...

    SBIR Phase I 2019 Department of CommerceNational Institute of Standards and Technology
  2. Advanced Manufacturing and Material Measurements Software Tool Weave ™ for the Acceleration and Automation of SEM Image Analysis in the Semiconductor Industry

    SBC: Sandbox Semiconductor Incorporated            Topic: None

    In this Phase I SBIR proposal, SandBox Semiconductor™ proposes to develop an Advanced Manufacturing and Material Measurements software tool called Weave ™ for accelerating and automating SEM image analysis for the semiconductor industry. During the development of a new manufacturing process line for a semiconductor device, tens of thousands of scanning electron microscopy (SEM) images are take ...

    SBIR Phase I 2019 Department of CommerceNational Institute of Standards and Technology
  3. Nanomachine Device for Semiconductor Process Control Monitoring

    SBC: XALLENT INC.            Topic: None

    Conventional characterization and test methods are increasingly ineffective when applied to structures less than 100 nanometers, causing challenges across R&D, process control and failure analysis. An increasing number of subtle defects become prominent drivers of failure as device size and operating margins decrease, e.g., processing anomalies in thin gate oxides, substrate problems related to do ...

    SBIR Phase I 2019 Department of CommerceNational Institute of Standards and Technology
US Flag An Official Website of the United States Government