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The Award database is continually updated throughout the year. As a result, data for FY24 is not expected to be complete until March, 2025.

Download all SBIR.gov award data either with award abstracts (290MB) or without award abstracts (65MB). A data dictionary and additional information is located on the Data Resource Page. Files are refreshed monthly.

The SBIR.gov award data files now contain the required fields to calculate award timeliness for individual awards or for an agency or branch. Additional information on calculating award timeliness is available on the Data Resource Page.

  1. Conversion Process for Legacy Stable Based Printed Circuit Board Atrwork

    SBC: Aci Technologies Inc            Topic: N/A

    Master artwork for Air Force systems is traditionally delivered on polyester-based mylar film. This film tends to degrade over time, even when stored in climate-controlled facilities. In addition, drawings must be digitized before circuit boards can be manufactured, which is an expensive and time consuming step. A reliable and repeatable artwork conversion process is needed.This project will pe ...

    SBIR Phase I 1998 Department of DefenseAir Force
  2. Design, Manufacture, and Test of an Underwater Acoustic Intensity Probe

    SBC: Acoustech Corporation            Topic: N/A

    The Acoustech Corporation as the prime contractor and the Pennsylvania State University - Applied Research Labc-atory as the subcontractor propose to design, manufacture, and test an underwater acoustic intensity probe containing a geophone and two-hydrophones encased in a neutrally buoyant package. The results of this proposed effort are anticipated to be highly successful since the researc ...

    SBIR Phase II 1998 Department of DefenseOffice of the Secretary of Defense
  3. Modulation-Doped A1 GaN/Gan Heterostructures and Devices on Semi-Insulating SIC Substrates

    SBC: Advanced Technologies/Laboratories Intl            Topic: N/A

    The need for compact solid state ultraviolet light sources includes clinical light sources for a variety of surgeries, analytical instrumentation sources and communications systems based on shorter wavelengths that will be able to handle higher information densities. Such advanced optoelectric applications demand totally new materials. Of those available, silicon carbide is the most promising for ...

    SBIR Phase II 1998 Department of DefenseMissile Defense Agency
  4. Interconnect Technology for High Temperature SiC Integrated Circuits

    SBC: Advanced Technologies/Laboratories Intl            Topic: N/A

    Integration of many different devices on a single silicon carbide (SiC) substrate is necessary to realize the full potential of high temperature or high power devices for markets ranging from industrial and consumer to military systems to transportation power and control. Integration requires that the entire device package, individual devices, contacts and interconnect materials, be ...

    SBIR Phase II 1998 Department of DefenseAir Force
  5. High Brightness LEDs based on the (A1, Ga,In)N Materials System

    SBC: Advanced Technologies/Laboratories Intl            Topic: N/A

    116 High Brightness LEDs based on the (Al, Ga,In)N Materials System--Advanced Technology Materials, Inc., 7 Commerce Drive, Danbury, CT 06810-4131; Dr. Karim Boutros, Principal Investigator Dr. Duncan W. Brown, Business Official DOE Grant No. DE-FG02-97ER82319 Amount: $75,000 Based on a combination of physical, electronic and optical properties, the semiconductor materials system (aluminum, g ...

    SBIR Phase II 1998 Department of Energy
  6. High Temperature III-V Nitride RF Electronics

    SBC: Advanced Technologies/Laboratories Intl            Topic: N/A

    The III-V nitrides, (Al, In, Ga)N, are promising materials for high temperature, high power and high frequency devices due to the wide bandgaps, high electron saturation velocity and high electronic mobility transistor (HEMT) structures available in this alloy system. These devices would find wide-spread commercial use as power amplifiers in base station transmitters for personal communications ...

    SBIR Phase II 1998 Department of DefenseAir Force
  7. Novel Polishing and Reactor Technologies for SiC Epitaxial Growth

    SBC: Advanced Technologies/Laboratories Intl            Topic: N/A

    Commercially viable silicon carbide device manufacturing processes depend on an ability to grow'low defect density epitaxial layers. Low defect density epitaxial layers start with pristine SiC substrate surfaces. Epi-ready pristine SiC surfaces are not commercially available. The results of this-programme should remedy this. In Phase I we will demonstrate a cost-effective, reproducible ex-situ sur ...

    SBIR Phase II 1998 Department of DefenseMissile Defense Agency
  8. HIGH TEMPERATURE INTEGRATED CAPACITORS

    SBC: Advanced Technologies/Laboratories Intl            Topic: N/A

    Next generation power electronic systems for military aircraft will require capacitors with reliable performance at temperatures from -55 up to 300 degrees C and beyond for filters, power converters and other control circuitry. Thin film integrated passive devices with lower dissipation and electrical leakage will also be needed, especially at high frequencies. Thin films have inherently high bre ...

    SBIR Phase I 1998 Department of DefenseAir Force
  9. Vandium Precursors for Semi-Insulating SiC Epilayers

    SBC: Advanced Technologies/Laboratories Intl            Topic: N/A

    Silicon carbide (SiC) is an ideal semiconductor material for high temperature, high frequency, and high power electronic devices. A SiC technology analogous to silicon - on -insulator (SOI) will be feasible if a suitable dopant precursor and epitaxial growth technique to produce semi-insulating SiC can be developed. Vanadium is an attractive dopant for the formation of semi-insulating SiC. In Phas ...

    SBIR Phase I 1998 Department of DefenseMissile Defense Agency
  10. Radiation hard, nonvolatile, NRDO memory elements

    SBC: Advanced Technologies/Laboratories Intl            Topic: N/A

    Metal-ferroelectric-semiconductor field effect transistors (MFS-FETs) have a can be used as nonvolatile memory devices. The primary ferroelectric materials for these devices are perovskite oxides such as lead zirconium titanate (PZT) and strontium bismuth tantalate (SBT). These materials contain highly mobile elements (Pb and Bi) that can interact with silicon at process temperatures and lead to a ...

    SBIR Phase I 1998 Department of DefenseMissile Defense Agency
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