Award Data

Cost effective semiconductor processing tools that enable the high-resolution nano-fabrication of low-volume electronics are needed by the DOD. The printing of ultra-fine gratings on silicon wafers using interference immersion lithography is envisaged as a first maskless process step in the fabrication of advanced application specific integrated circuits. Next generation interference immersion lit ...

The Progeny – University of Utah team proposes a new approach for flow noise reduction to improve acoustic sensor performance. Our proposal is to investigate the ability of controlling the turbulent flow by utilizing acceleration which makes the flow locally laminar. Our proposed method of achieving acceleration is to send the flow around a concave surface, by adding a “two-dimensional bump ...