Novel Reactive Chemical Mechanical Polishing (RCMP) Technology for fabrication of Large, Non-flat SiC mirrors

Award Information
Agency: Department of Defense
Branch: Missile Defense Agency
Contract: HQ0006-10-C-7341
Agency Tracking Number: B093-024-0518
Amount: $100,000.00
Phase: Phase I
Program: SBIR
Awards Year: 2010
Solicitation Year: 2009
Solicitation Topic Code: MDA09-024
Solicitation Number: 2009.3
Small Business Information
Sinmat Inc
2153 Hawthorne Road, GTEC Center, Suite 129, Box2, Gainesville, FL, 32641
DUNS: 024935517
HUBZone Owned: N
Woman Owned: Y
Socially and Economically Disadvantaged: N
Principal Investigator
 Deepika Singh
 President & CEO
 (352) 334-7237
Business Contact
 Deepika Singh
Title: President & CEO
Phone: (352) 334-7237
Research Institution
Silicon Carbide (SiC) due to its superior thermal and mechanical properties serves as an attractive candidate as mirror material. The manufacturing of such mirrors is a critical challenge because of the hardness and chemical inertness of the material. The current state-of-the-art polishing methods are either typically very slow or introduce a high density of defects, scratches, or large stresses. Sinmat, in collaboration with Penn State University, plans to investigate a novel Reactive Chemical Mechanical Planarization (RCMP) method to rapidly polish non-planar SiC mirrors. This method is expected to be (2X to 10X) faster than conventional methods and has the ability to reduce/eliminate high and mid frequency surface roughness introduced by other methods. In the Phase I of this project, we plan to demonstrate the feasibility of this RCMP process to rapidly polish non-flat SiC mirrors, whereas in Phase II we plan to integrate the process with manufacturing companies, to fabricate large SiC mirrors.

* information listed above is at the time of submission.

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