Heavy Metal Ion Removal and Wastewater Treatment by Influence of Magnetic and Electrical Fields

Award Information
Agency:
Department of Defense
Branch
Army
Amount:
$648,704.00
Award Year:
1998
Program:
SBIR
Phase:
Phase II
Contract:
n/a
Award Id:
26292
Agency Tracking Number:
26292
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
1133 East 35th Street, Brooklyn, NY, 11210
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
Dr. Vladimir Mindlin
(718) 338-3311
Business Contact:
() -
Research Institution:
n/a
Abstract
A number of arsenals and depots such as Toby Hann Army Depot, PA, and Corpus Christy Army Depot, employ electroplating technology which generates chrome, nickel and cadmium metal ions requiring removal from the wastewater. A cost-effective method is needed for removal of heavy metal ions from small plating operations. DoD grant applications are sought for the development of innovative processes for treating wastewater ex situ. To solve the problem, Beltran proposes to study combined techniques that include Magnetic Particle Technology and 3-D (Three Dimensional) Combined Magnetic Particle and 3-D Electrochemical Technology -- Combined Technology -- or CT). Of interest are processes that can reclaim the heavy metals for subsequent refining. The extent of development in Phase II will be sufficient to scale up to a small field test. The Phase I program will develop and prove the concept of using CT and/or MPRT in wastewater treatment. The prof of concept will include a safety and environmental impact study. The Phase II program will develop a prototype CT and/or magnetic particle resin technology which takes advantage of the negative charge present on colloidal impurities in sewage, effluent, and raw water. The theoretical treatment process may involve changing the ion charge on magnetite, contacting the effluent, inducing flocculation, clarifying, and release of the impurities from teh magnetite.

* information listed above is at the time of submission.

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