Fast Ship Drag Reduction

Award Information
Agency:
Department of Defense
Branch
Defense Advanced Research Projects Agency
Amount:
$98,949.00
Award Year:
1999
Program:
SBIR
Phase:
Phase I
Contract:
98SB20095
Award Id:
44831
Agency Tracking Number:
98SB20095
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
1133 E. 35th Street, Brooklyn, NY, 11210
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
Eduard Amromin
(718) 377-0227
Business Contact:
() -
Research Institution:
n/a
Abstract
Not Available Capacitors are formed by depositing a dielectric between two conductive plates. While fabrication techniques achieve outstanding levels of repeatabillity and consistency, many applications are difficult to fullfill with current manufacturing methods. A solid state resistor film may be trimmed to a certain value after deposition by the selective ablation of the resisting medium by a laser beam. A capacitor, however, is formed by the entrapment of a dielectric material between the metal conductors. We propose the development of a capacitor using a dielectric material that has a dielectric constant which may be altered by exposure to ultraviolet radiation after deposition to provide a basis for trimmable or tunable capacitive devices. This will involve the use of organosilicon materials plasma polymerized at room temperature and a photo oxidative polymer which when exposed to UV and oxygen will pattern and is alterable with UV dosage. As the literature shows no indication of work in this area discussions with users are needed to develop and identify specific areas of application.

* information listed above is at the time of submission.

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