CHEMICALLY AMPLIFIED POSITIVE (CAMP) RESISTS FOR WAVEGUIDE APPLICATIONS

Award Information
Agency: National Science Foundation
Branch: N/A
Contract: N/A
Agency Tracking Number: 27462
Amount: $65,000.00
Phase: Phase I
Program: SBIR
Awards Year: 1994
Solitcitation Year: N/A
Solitcitation Topic Code: N/A
Solitcitation Number: N/A
Small Business Information
Brewer Science Inc.
Po Box Gg, Rolla, MO, 65401
Duns: N/A
Hubzone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Jim Meador
 (314) 364-0300
Business Contact
Phone: () -
Research Institution
N/A
Abstract
WAVEGUIDES ARE USED TO TRANSMIT LIGHT THROUGH OPTICAL PROCESSORS. COMBINING THE RESOLUTION POTENTIAL OF DEEP-UV PHOTOLITHOGRAPHY AND THE EXTREME SENSITIVITY/HIGH CONTRAST OF CHEMICALLY AMPLIFIED POSITIVE ACTING (CAMP) RESISTS OFFERS A POTENTIALLY SIMPLE METHOD FOR FABRICATING HIGHLY RESOLVED, POLYMERIC WAVEGUIDES STRUCTURES. CAMP RESISTS CAN BE MATED WITH OTHER CLADDING MATERIALS WITH LOWER REFRACTIVE INDICES TO PROVIDE THE NECESSARY GRADIENT. THE OBJECTIVES OF THIS PROJECT ARE TO OPTIMIZE CAMP RESISTS FOR WAVEGUIDE APPLICATIONS, TO DIRECTLY FABRICATE STRUCTURE USING DEEP-UV EXPOSURE, AND TO CHARACTERIZE THE STRUCTURE'S PERFORMANCE. CAMP RESISTS (THIN FILM) ARE NOTED FOR OUTSTANDING SENSITIVITY, CONTRAST, AND RESOLUTION; BUT THICK FILM PERFORMANCE IS NOT WELL DOCUMENTED. INVESTIGATORS ARE SYNTHESIZING TWO ACID-SENSITIVE POLYMERS POLY(P-T-BUTOXY-CARBONYLOXYSTYRENE) AND POLY(P-T-BUTOXYCARBONYLOXYSTYRENE-SULFONE)} AND TWO PHOTOACID GENERATORS (2,6-DINITROBENZYL TOSYLATE AND TRIPHENYLSULFONIUM TRIFLATE). THE POLYMERS AND PHOTOACID GENERATORS ARE CHEMICALLY CHARACTERIZED; AND FORMULATED RESISTS TESTED FOR THICK FILM APPLICATION PERFORMANCE, DEEP-UV SENSITIVITY, CONTRAST, RESOLUTION, NEAR INFRARED ABSORPTION, AND REFRACTIVE INDEX. RESIST(S) WILL BE MICROMACHINED INTO WAVEGUIDES AND AT LEAST ONE STRUCTURE CHARACTERIZED (OPTICAL LOSS, SEM, REFRACTIVE INDEX).

* information listed above is at the time of submission.

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