Novel Wet Developable Materials for DUV Lithography

Award Information
Agency:
Department of Defense
Branch
Missile Defense Agency
Amount:
$65,000.00
Award Year:
2002
Program:
SBIR
Phase:
Phase I
Contract:
DASG60-02-P-0201
Award Id:
58989
Agency Tracking Number:
02-0287
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
2401 Brewer Drive, Rolla, MO, 65401
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
019689330
Principal Investigator:
JodyNeef
Principle Investigator
(573) 364-0300
jody.neef@brewerscience.com
Business Contact:
NormanDobson
Managing Director, R&D
(573) 364-0300
ndobson@brewerscience.com
Research Institute:
n/a
Abstract
"Acute competitive pressures to produce ever faster and more complex integrated circuits at diminishing costs continually drive IC manufacturers to find new, improved materials and processes without investing in new equipment sets. Currently in themicroelectronic industry, most equipment sets utilize deep ultraviolet (DUV) lasers in photolithography. One promising avenue to meet this demand for lower cost of ownership in DUV photolithography is the development of new materials to use as wetdevelopable DUV bottom antireflective coatings (BARCs). BARCs are necessary to control reflections of light from the substrate surface when the photoresist is exposed to light. Traditional BARC technology requires a four-step process including anadditional etch step to remove the BARC. In contrast, photolithography with a wet developable BARC requires only three steps because the BARC is removed concurrently with the photoresist. This will not only reduce cost, but also increase manufacturingthroughput because fewer production steps will be required. This new material will meet industry requirements such as low reflectivity, spin bowl compatibility, photoresist compatibility, and patternability. These characteristics will allow easyintegration of wet developable DUV BARCs into current equipment sets without further investment. A wet developable, DUV BARC will greatly reduce the cost of ownership in photolithography. Anticipated savings will

* information listed above is at the time of submission.

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