SBIR Phase I: Bottom Anti-Reflective Coatings - BARCs - for Production of Advanced Semiconductor Devices by 157 nm Lithography

Award Information
Agency: National Science Foundation
Branch: N/A
Contract: 0319158
Agency Tracking Number: 0319158
Amount: $100,000.00
Phase: Phase I
Program: SBIR
Awards Year: 2003
Solicitation Year: N/A
Solicitation Topic Code: N/A
Solicitation Number: N/A
Small Business Information
2401 High Tech Drive, Box GG, Rolla, MO, 65401
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Liu He
 () -
Business Contact
Phone: () -
Research Institution
This Small Business Innovation Research Phase I project will develop bottom anti-reflective coatings (BARCs) for production of advanced semiconductor devices by 157 nm lithography . The NSF Phase I technical objectives are to demonstrate the feasibility of potential technical approaches to workable 157nm BARCs. The prototype 157 nm BARCs will be produced and characterized for critical industry requirements such as low reflectivity, fast plasma etching rate, and lithographic performance. At least one prototype will be selected and optimized for use with 157-nm photoresists so that the commercialization will be projected in the Phase II. The 157-nm BARCs developed from the NSF Phase I study will result in a significant step forward for 157-nm lithography technology and contribute to the future of advanced semiconductor devices (integrated circuits) fabrication.

* Information listed above is at the time of submission. *

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