SiC Epitaxial Growth by Halo-hydrocarbon Precursor Growth

Award Information
Agency: Department of Defense
Branch: Navy
Contract: N00014-04-M-0226
Agency Tracking Number: N045-029-0200
Amount: $69,989.00
Phase: Phase I
Program: STTR
Awards Year: 2004
Solicitation Year: 2004
Solicitation Topic Code: N04-T029
Solicitation Number: N/A
Small Business Information
4514 Plummer street, Pittsburgh, PA, 15201
DUNS: 147973353
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Olle Kordina
 Senior Vice President
 (813) 842-7398
Business Contact
 Rajiv Enand
Title: President and CEO
Phone: (724) 272-7250
Research Institution
 University of South Florida
 Stephen Saddow
 4202 East Fowler Avenue, ENB 118
Tampa, FL, 33620
 (813) 974-4773
 Nonprofit college or university
The epitaxial growth of SiC is limited by two main processes; homogeneous nucleation and surface mobility at high growth rates. We propose to investigate the growth of SiC using three different halo-hydrocarbons and two or three different chlorinated Si chemistries and also combine the most promising carbon and silicon chemistries. The goal from phase I is to suggest a suitable chemistry eliminating homogeneous nucleation and furthermore investigate the lower limits in temperature where significantly higher growth rates (> 20 micrometer/h) can be achieved without deteriorating the crystalline quality. Low temperature growth is believed to greatly reduce the impurities leeching out of the hot graphite susceptor and the quartz. Lower temperature processes giving impeccable crystalline quality are thus essential if high voltage (>10kV) power devices are to be made. Another goal of the phase I effort is to suggest a suitable reactor configuration for improved utilization of the proposed chemistry.

* information listed above is at the time of submission.

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