SiC Epitaxial Growth by Halo-hydrocarbon Precursor Growth

Award Information
Agency:
Department of Defense
Branch
Navy
Amount:
$69,989.00
Award Year:
2004
Program:
STTR
Phase:
Phase I
Contract:
N00014-04-M-0226
Award Id:
70463
Agency Tracking Number:
N045-029-0200
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
4514 Plummer street, Pittsburgh, PA, 15201
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
147973353
Principal Investigator:
Olle Kordina
Senior Vice President
(813) 842-7398
olle.kordina@caracalsemi.com
Business Contact:
Rajiv Enand
President and CEO
(724) 272-7250
rajiv.enand@caracalsemi.com
Research Institute:
University of South Florida
Stephen Saddow
4202 East Fowler Avenue, ENB 118
Tampa, FL, 33620
(813) 974-4773
Nonprofit college or university
Abstract
The epitaxial growth of SiC is limited by two main processes; homogeneous nucleation and surface mobility at high growth rates. We propose to investigate the growth of SiC using three different halo-hydrocarbons and two or three different chlorinated Si chemistries and also combine the most promising carbon and silicon chemistries. The goal from phase I is to suggest a suitable chemistry eliminating homogeneous nucleation and furthermore investigate the lower limits in temperature where significantly higher growth rates (> 20 micrometer/h) can be achieved without deteriorating the crystalline quality. Low temperature growth is believed to greatly reduce the impurities leeching out of the hot graphite susceptor and the quartz. Lower temperature processes giving impeccable crystalline quality are thus essential if high voltage (>10kV) power devices are to be made. Another goal of the phase I effort is to suggest a suitable reactor configuration for improved utilization of the proposed chemistry.

* information listed above is at the time of submission.

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