LOW COST MULTILAYERED PZT CAPACITORS MADE USING CCVD

Award Information
Agency: Department of Defense
Branch: Missile Defense Agency
Contract: N/A
Agency Tracking Number: 25574
Amount: $748,147.00
Phase: Phase II
Program: SBIR
Awards Year: 1995
Solicitation Year: N/A
Solicitation Topic Code: N/A
Solicitation Number: N/A
Small Business Information
Ccvd, Inc.
430 Tenth Street, Nw, Suite, N-008, Atlanta, GA, 30318
DUNS: N/A
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Andrew Hunt, Phd
 (404) 874-6550
Business Contact
Phone: () -
Research Institution
N/A
Abstract
Combustion chemical vapor deposition (CCVD), which was invented by the principal investigator, is a high quality film deposition technique that can inexpensively and quickly apply lead zirconate-titanate (PZT) thin films in a continuos manner. This technology can be used for the production of ferroelectric capacitors. CCVD is low cost, high quality and versatile. It does not require a reaction chamber or furnace, yet the thin films produced are comparable in quality to CVD films, and CCVD technology allows substrates to be passed through a depostion zone for multilayered, production line or large area coatings. We have produced CVD quality films of numerous materials using CCVD in the open atmosphere without a furnace or reaction chamber. Thin films of PZT will be grown using CCVD, and the stoichiometry, morphology, microstructure, and electrical properties of the films will be determined as a function of deposition conditions.

* information listed above is at the time of submission.

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