Award Information
Agency: Department of Defense
Branch: Missile Defense Agency
Contract: N/A
Agency Tracking Number: 25574
Amount: $748,147.00
Phase: Phase II
Program: SBIR
Awards Year: 1995
Solicitation Year: N/A
Solicitation Topic Code: N/A
Solicitation Number: N/A
Small Business Information
430 Tenth Street, Nw, Suite, N-008, Atlanta, GA, 30318
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Andrew Hunt, Phd
 (404) 874-6550
Business Contact
Phone: () -
Research Institution
Combustion chemical vapor deposition (CCVD), which was invented by the principal investigator, is a high quality film deposition technique that can inexpensively and quickly apply lead zirconate-titanate (PZT) thin films in a continuos manner. This technology can be used for the production of ferroelectric capacitors. CCVD is low cost, high quality and versatile. It does not require a reaction chamber or furnace, yet the thin films produced are comparable in quality to CVD films, and CCVD technology allows substrates to be passed through a depostion zone for multilayered, production line or large area coatings. We have produced CVD quality films of numerous materials using CCVD in the open atmosphere without a furnace or reaction chamber. Thin films of PZT will be grown using CCVD, and the stoichiometry, morphology, microstructure, and electrical properties of the films will be determined as a function of deposition conditions.

* Information listed above is at the time of submission. *

Agency Micro-sites

SBA logo
Department of Agriculture logo
Department of Commerce logo
Department of Defense logo
Department of Education logo
Department of Energy logo
Department of Health and Human Services logo
Department of Homeland Security logo
Department of Transportation logo
Environmental Protection Agency logo
National Aeronautics and Space Administration logo
National Science Foundation logo
US Flag An Official Website of the United States Government