LOW COST MULTILAYERED PZT CAPACITORS MADE USING CCVD

Award Information
Agency:
Department of Defense
Branch
Missile Defense Agency
Amount:
$748,147.00
Award Year:
1995
Program:
SBIR
Phase:
Phase II
Contract:
n/a
Award Id:
25574
Agency Tracking Number:
25574
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
430 Tenth Street, Nw, Suite, N-008, Atlanta, GA, 30318
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
Andrew Hunt, Phd
(404) 874-6550
Business Contact:
() -
Research Institute:
n/a
Abstract
Combustion chemical vapor deposition (CCVD), which was invented by the principal investigator, is a high quality film deposition technique that can inexpensively and quickly apply lead zirconate-titanate (PZT) thin films in a continuos manner. This technology can be used for the production of ferroelectric capacitors. CCVD is low cost, high quality and versatile. It does not require a reaction chamber or furnace, yet the thin films produced are comparable in quality to CVD films, and CCVD technology allows substrates to be passed through a depostion zone for multilayered, production line or large area coatings. We have produced CVD quality films of numerous materials using CCVD in the open atmosphere without a furnace or reaction chamber. Thin films of PZT will be grown using CCVD, and the stoichiometry, morphology, microstructure, and electrical properties of the films will be determined as a function of deposition conditions.

* information listed above is at the time of submission.

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