Development of a Truly Lattice-Matched III-Nitride Technology for

Award Information
Agency:
Department of Defense
Branch
Missile Defense Agency
Amount:
$70,000.00
Award Year:
2001
Program:
STTR
Phase:
Phase I
Contract:
N00014-01-M-0228
Award Id:
53176
Agency Tracking Number:
01-0005T
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
1019 Collier Road, Suite C1, Atlanta, GA, 30318
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
826426025
Principal Investigator:
JeffNause
President
(404) 351-0005
jnause@cermetinc.com
Business Contact:
JeffNause
President
(404) 351-0005
jnause@cermetinc.com
Research Institute:
GEORGIA INSTITUTE OF TECHNOLOGY
Kathy Moore-Hall
505 Tenth Street
Atlanta, GA, 30332
(404) 894-4544
Nonprofit college or university
Abstract
Cermet, in collaboration with researchers at Georgia Institute of Technology, proposes to implement a lattice matched III-Nitride technology using existing substrates. The implementation of a lattice matched substrate promises to produce near dislocationfree III-Nitrides for the first time while the use of an existing substrate technology dramatically lowers development cost and reduces the development cycle. Specifically, we propose to use existing semiconductor substrates to grow lattice matched InGaNto produce superior optoelectronic/electronic devices. The target composition of InGaN will result in the lowest wavelength emitters possible without the necessity of expensive UV-grade optics, has highly efficient emission, and should lead to improvedmobility in transistor devices. Highly efficient, vertical current nitride LEDs and FETs will be demonstrated early in Phase II, based on the successful completion of phase I objectivesThe successful completion of Phase I goals will demonstrate theutility of using this technology to improve the performance of high frequency electronic devices and short wavelength LED's, laser diodes, and detectors.

* information listed above is at the time of submission.

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