Development of ZnO spin Field Effect Transistor (FET)

Award Information
Agency:
Department of Defense
Branch
Air Force
Amount:
$99,741.00
Award Year:
2003
Program:
STTR
Phase:
Phase I
Contract:
F49620-03-C-0118
Award Id:
62689
Agency Tracking Number:
F033-0313
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
1019 Collier Road, Suite C1, Atlanta, GA, 30318
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
826426025
Principal Investigator:
VaratharajanRengaraj
Principal Research Engineer
(404) 351-0005
vrajan@cermetinc.com
Business Contact:
JeffNause
President
(404) 351-0005
jnause@cermetinc.com
Research Institute:
PROF. HADIS MORKO¿
Deborah W Valenti
Virginia Commonwealth Univ., 601 West Main St.
Richmond, VA, 23284
(804) 827-3322
Nonprofit college or university
Abstract
The goal of this effort is to grow transition metal doped ZnO on native substrates, characterize the films, and design a prototype spin FET based on ZnO. The main objective of phase I will be to demonstrate the growth of high quality homoepitaxial thisfilms of transition metal doped ZnO on ZNO using Cermet's MOCVD technology and in-house fabricated substrates. The quality of the films will be analyzed by X-ray, PL and DLTS. Electrical and magnetic properties will be investigated. Successfulcompletion of Phase I will yield room temperature spintronic material based ZnO for electronic and optical applications. This proposed work provides basis for a spin FET with more efficient operation. Spin FET needs less power than a conventional FET andits efficiency is higher than the conventional FET. Defense systems, automotive, commercial aviation and commercial communications industries will benefit from this technology

* information listed above is at the time of submission.

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