ALD for H2O and O2 Barriers for Flexible OLEDs

Award Information
Agency:
Department of Defense
Branch
Defense Advanced Research Projects Agency
Amount:
$94,820.00
Award Year:
2010
Program:
SBIR
Phase:
Phase I
Contract:
N10PC20169
Award Id:
96736
Agency Tracking Number:
10SB1-0005
Solicitation Year:
n/a
Solicitation Topic Code:
DARPA 10-001
Solicitation Number:
n/a
Small Business Information
68 Rogers St., Cambridge, MA, 02142
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
142288500
Principal Investigator:
Mark Sowa
Senior Research Scientist
(617) 674-8811
sowa@cambridgenanotech.com
Business Contact:
Ganesh Sundaram
Vice President of Research
(617) 674-8806
sundaram@cambridgenanotech.com
Research Institute:
n/a
Abstract
Atomic Layer Deposition (ALD) has been widely studied for water permeation barriers for flexible OLED displays. Inorganic films of approximately 100nm have been demonstrated to reduce the water vapor transmission rate (WVTR) to 6e-7 g/m^2/d at room temperature. However, these films crack at less than 2% strain. Inorganic ALD films cannot withstand the required 5% strain until their thickness is reduced to 5nm at which point the WVTR becomes unacceptably high. Hybrid inorganic/organic ALD films have demonstrated enhanced strain resilence but few chemistries have thus far been studied, and their optimized WVTR and mechanical flexibility have yet to be determined. We propose to investigate several classes of new precursor chemicals to generate hybrid inorganic/organic films to assess their applicability for encapsulating flexible OLED displays. Once the best chemistry has been identified and optimized, we will leverage our companies history of successful scaling to commercial manufacturing of ALD processes.

* information listed above is at the time of submission.

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