ALD for H2O and O2 Barriers for Flexible OLEDs

Award Information
Agency: Department of Defense
Branch: Defense Advanced Research Projects Agency
Contract: N10PC20169
Agency Tracking Number: 10SB1-0005
Amount: $94,820.00
Phase: Phase I
Program: SBIR
Awards Year: 2010
Solicitation Year: 2010
Solicitation Topic Code: SB101-001
Solicitation Number: 2010.1
Small Business Information
Cambridge NanoTech, Inc.
68 Rogers St., Cambridge, MA, 02142
DUNS: 142288500
HUBZone Owned: N
Woman Owned: Y
Socially and Economically Disadvantaged: N
Principal Investigator
 Mark Sowa
 Senior Research Scientist
 (617) 674-8811
 sowa@cambridgenanotech.com
Business Contact
 Ganesh Sundaram
Title: Vice President of Research
Phone: (617) 674-8806
Email: sundaram@cambridgenanotech.com
Research Institution
N/A
Abstract
Atomic Layer Deposition (ALD) has been widely studied for water permeation barriers for flexible OLED displays. Inorganic films of approximately 100nm have been demonstrated to reduce the water vapor transmission rate (WVTR) to 6e-7 g/m^2/d at room temperature. However, these films crack at less than 2% strain. Inorganic ALD films cannot withstand the required 5% strain until their thickness is reduced to 5nm at which point the WVTR becomes unacceptably high. Hybrid inorganic/organic ALD films have demonstrated enhanced strain resilence but few chemistries have thus far been studied, and their optimized WVTR and mechanical flexibility have yet to be determined. We propose to investigate several classes of new precursor chemicals to generate hybrid inorganic/organic films to assess their applicability for encapsulating flexible OLED displays. Once the best chemistry has been identified and optimized, we will leverage our companies history of successful scaling to commercial manufacturing of ALD processes.

* information listed above is at the time of submission.

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