Electronic grade, single crystal or large-grain polycrystalline diamond wafer development.

Award Information
Agency: Department of Defense
Branch: Army
Contract: W911QX-18-C-0017
Agency Tracking Number: A2-7045
Amount: $499,575.51
Phase: Phase II
Program: SBIR
Solicitation Topic Code: A16-021
Solicitation Number: 2016.1
Solicitation Year: 2016
Award Year: 2018
Award Start Date (Proposal Award Date): 2018-05-01
Award End Date (Contract End Date): 2019-04-30
Small Business Information
4715 Steiner Ranch Blvd, Austin, TX, 78732
DUNS: 071449319
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 William Holber
 (781) 856-3085
Business Contact
 Sherri Basnett
Phone: (512) 267-7087
Email: s.basnett@plasmability.com
Research Institution
The goal of the Phase II program is to demonstrate growth of large-area single-crystal diamond substrates having surface area of 6 cm2 and suitable for electronic device applications. This will represent a major leap in available substrate area, from less than 1 cm2 available today. The technical path will directly follow the work begun in the Phase I program, which is, using our toroidal plasma CVD diamond deposition reactor,start with a single crystal seed and grow a large bulk piece of material through growth in one direction first and then growth in a 90-degree direction subsequently. The finished piece of bulk material can then be laser trimmed and polished and used as a master seed to grow thin wafers with about 1 day of growth. Michigan State University (MSU), our university partner in this effort, will perform all post-bulk growth processing and analysis, including laser cutting, polishing, optical and electron microscopy, and characterization of free hole density, channel Hall mobility, thermal conductivity and surface roughness.

* Information listed above is at the time of submission. *

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