Point Of Use Chlorine Gas Generator For Wafer Fabrication

Award Information
Agency:
Department of Defense
Branch
Defense Advanced Research Projects Agency
Amount:
$62,420.00
Award Year:
1993
Program:
SBIR
Phase:
Phase I
Contract:
n/a
Agency Tracking Number:
19726
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
Electron Transfer
P.o. Box 160, Princeton, NJ, 08542
Hubzone Owned:
N
Socially and Economically Disadvantaged:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
William Ayers
(609) 921-0070
Business Contact:
() -
Research Institution:
n/a
Abstract
A point of use generator for chlorine gas production is proposed. The generator would provide ultrahigh purity chlorine which is necessary to enhance the growth rate and decrease the impurity level in silicon oxides for silicon device fabrication. The generator will also eliminate the need for environmentally unacceptable organochlorine compounds which are presently used for oxide growth enhancement. ANTICIPATED BENEFITS: The chlorine generator could provide very high purity gas to enhance silicon oxide growth. This would improve silicon device performance and stability.

* information listed above is at the time of submission.

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