Chemical Nano-Imprint Lithography

Award Information
Agency: Department of Defense
Branch: Defense Advanced Research Projects Agency
Contract: W31P4Q-05-C-0177
Agency Tracking Number: 04SB1-0511
Amount: $749,958.00
Phase: Phase II
Program: SBIR
Awards Year: 2005
Solicitation Year: 2004
Solicitation Topic Code: SB041-030
Solicitation Number: 2004.1
Small Business Information
51 East Main Street Suite 203, Newark, DE, 19711
DUNS: 071744143
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Ahmed Sharkawy
 Senior Engineer
 (302) 456-9003
Business Contact
 Eric Kelmelis
Title: Vice President
Phone: (302) 456-9003
Research Institution
The overall objective of this Phase II project is to optimize the fabrication procedure associated with the chemical lithography proposed in Phase I to fabricate nanophotonic structures and devices at a fraction of the cost of existing technologies. We plan to use our optimized chemical lithography procedure to fabricate an ultra-high resolution patterns and devices including nano-probe for near field scanning optical microscopy, nanolithography. This device will be based on three-dimensional photonic crystal technology, which will help provide ultra high spatial resolution while maintaining high spectral and temporal resolving power. It is also likely due its small size, high resolution, and dynamic range that this probe will find its natural application in single molecule detection in physical and biological sciences as well as studying a small number of quantum dots. Results of this work will have applications in other micro-optic and Nano-MEMS technologies for chemical biosensors. During Phase II, we plan to optimize and refine the fabrication procedures explored in phase I to implement and help commercialize nanophotonic based devices to develop next generation high resolution nano-lithographic based systems.

* information listed above is at the time of submission.

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