Chemical Nano-Imprint Lithography

Award Information
Agency:
Department of Defense
Branch
Defense Advanced Research Projects Agency
Amount:
$749,958.00
Award Year:
2005
Program:
SBIR
Phase:
Phase II
Contract:
W31P4Q-05-C-0177
Award Id:
68827
Agency Tracking Number:
04SB1-0511
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
51 East Main Street Suite 203, Newark, DE, 19711
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
071744143
Principal Investigator:
Ahmed Sharkawy
Senior Engineer
(302) 456-9003
sharkawy@emphotonics.com
Business Contact:
Eric Kelmelis
Vice President
(302) 456-9003
kelmelis@emphotonics.com
Research Institution:
n/a
Abstract
The overall objective of this Phase II project is to optimize the fabrication procedure associated with the chemical lithography proposed in Phase I to fabricate nanophotonic structures and devices at a fraction of the cost of existing technologies. We plan to use our optimized chemical lithography procedure to fabricate an ultra-high resolution patterns and devices including nano-probe for near field scanning optical microscopy, nanolithography. This device will be based on three-dimensional photonic crystal technology, which will help provide ultra high spatial resolution while maintaining high spectral and temporal resolving power. It is also likely due its small size, high resolution, and dynamic range that this probe will find its natural application in single molecule detection in physical and biological sciences as well as studying a small number of quantum dots. Results of this work will have applications in other micro-optic and Nano-MEMS technologies for chemical biosensors. During Phase II, we plan to optimize and refine the fabrication procedures explored in phase I to implement and help commercialize nanophotonic based devices to develop next generation high resolution nano-lithographic based systems.

* information listed above is at the time of submission.

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