HYDROGEN RADICAL ASSISED METAL-ORGANIC CHEMICAL VAPOR DEPOSITION (HRAMOCVD) OF GAAS AND ALGAAS EXPITAXIAL LAYERS

Award Information
Agency:
Department of Defense
Branch
Air Force
Amount:
$406,767.00
Award Year:
1990
Program:
SBIR
Phase:
Phase II
Contract:
n/a
Award Id:
8573
Agency Tracking Number:
8573
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
35 Elizabeth Ave, Somerset, NJ, 08873
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
Richard Stall
(201) 753-1311
Business Contact:
() -
Research Institute:
n/a
Abstract
IMPROVED COMPOSITIONAL CONTROL AND ENHANCEMENT OF SEMICONDUCTOR AND OPTO-ELECTRONIC MATERIALS ARE NECESSARY FOR THE FUTURE DEVELOPMENT OF DEVICES WHICH ARE DEPENDENT ON COMPLEX ULTRA-STRUCTURES. THIS INVESTIGATION WOULD DIRECTLY EXAMINE THE EFFECTS OF HYDROGEN RADICALS ON THE GROWTH AND QUALITY OF DOPED AND UNDOPED GAAS AND ALGAAS. CARBON IMPURITIES ARE OFTEN A PROBLEM IN GAAS AND ALGAAS AND GIVE RISE TO P-TYPE MATERIAL. PRELIMINARY RESULTS AT EMCORE AND ELSEWHERE INDICATE THAT HRAMOCVD MAY IMPROVE MATERIAL PROPERTIES BY ELIMINATING CARBON IMPURITIES. THIS IS SUGGESTED BECAUSE P-TYPE MATERIAL IS CONVERTED TO N-TYPE WHEN A HYDROGEN PLASMA IS INTRODUCED. HYDROGEN RADICALS WILL BE PRODUCED UPSTREAM BY A MICROWAVE PLASMA SOURCE. PARTICULAR ATTENTION WILL BE PAID TO DISTINGUISHING BETWEEN PLASMA-GENERATED UV RADIATION GROWTH EFFECTS FROM HYDROGEN RADICAL EFFECTS. CHARACTERIZATION WOULD INCLUDE ROOM AND LOW TEMPERATURE PHOTOLUMINESCENCE (PL) AND HALL MEASUREMENTS. CHANGES IN GROWTH RATE WILL ALSO BE DOCUMENTED. PHASE I WOULD DEMONSTRATE THE EFFECTIVENESS OF THIS PROCESS ENHANCEMENT TECHNIQUE.

* information listed above is at the time of submission.

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