HYDROGEN RADICAL ASSISED METAL-ORGANIC CHEMICAL VAPOR DEPOSITION (HRAMOCVD) OF GAAS AND ALGAAS EXPITAXIAL LAYERS

Award Information
Agency: Department of Defense
Branch: Air Force
Contract: N/A
Agency Tracking Number: 8573
Amount: $406,767.00
Phase: Phase II
Program: SBIR
Awards Year: 1990
Solicitation Year: N/A
Solicitation Topic Code: N/A
Solicitation Number: N/A
Small Business Information
35 Elizabeth Ave, Somerset, NJ, 08873
DUNS: N/A
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Richard Stall
 (201) 753-1311
Business Contact
Phone: () -
Research Institution
N/A
Abstract
IMPROVED COMPOSITIONAL CONTROL AND ENHANCEMENT OF SEMICONDUCTOR AND OPTO-ELECTRONIC MATERIALS ARE NECESSARY FOR THE FUTURE DEVELOPMENT OF DEVICES WHICH ARE DEPENDENT ON COMPLEX ULTRA-STRUCTURES. THIS INVESTIGATION WOULD DIRECTLY EXAMINE THE EFFECTS OF HYDROGEN RADICALS ON THE GROWTH AND QUALITY OF DOPED AND UNDOPED GAAS AND ALGAAS. CARBON IMPURITIES ARE OFTEN A PROBLEM IN GAAS AND ALGAAS AND GIVE RISE TO P-TYPE MATERIAL. PRELIMINARY RESULTS AT EMCORE AND ELSEWHERE INDICATE THAT HRAMOCVD MAY IMPROVE MATERIAL PROPERTIES BY ELIMINATING CARBON IMPURITIES. THIS IS SUGGESTED BECAUSE P-TYPE MATERIAL IS CONVERTED TO N-TYPE WHEN A HYDROGEN PLASMA IS INTRODUCED. HYDROGEN RADICALS WILL BE PRODUCED UPSTREAM BY A MICROWAVE PLASMA SOURCE. PARTICULAR ATTENTION WILL BE PAID TO DISTINGUISHING BETWEEN PLASMA-GENERATED UV RADIATION GROWTH EFFECTS FROM HYDROGEN RADICAL EFFECTS. CHARACTERIZATION WOULD INCLUDE ROOM AND LOW TEMPERATURE PHOTOLUMINESCENCE (PL) AND HALL MEASUREMENTS. CHANGES IN GROWTH RATE WILL ALSO BE DOCUMENTED. PHASE I WOULD DEMONSTRATE THE EFFECTIVENESS OF THIS PROCESS ENHANCEMENT TECHNIQUE.

* Information listed above is at the time of submission. *

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