IMPROVED PRECURSORS FOR THE METALORGANIC CVD OF YBCO THIN FILMS

Award Information
Agency: Department of Defense
Branch: Missile Defense Agency
Contract: N/A
Agency Tracking Number: 15627
Amount: $49,315.00
Phase: Phase I
Program: SBIR
Awards Year: 1991
Solicitation Year: N/A
Solicitation Topic Code: N/A
Solicitation Number: N/A
Small Business Information
Emcore Corpon
35 Elizabeth Avenue, Somerset, NJ, 08873
DUNS: N/A
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Dr Peter E Norris
 Principal Investigator
 (908) 271-9090
Business Contact
Phone: () -
Research Institution
N/A
Abstract
THIS PROGRAM WILL DEVELOP SUITABLE PRECURSORS, PARTICULARLY FOR BARIUM WHICH EXHIBIT INCREASED VOLATILITY AND STABILITY IN THE METALORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD) PROCESS OF HTSC FILMS BY PYROLYZING ORGANOMETALLIC PRECURSORS AT THE SUBSTRATE SURFACE. MOCVD OFFERS THE ADVANTAGES OF SCALE-UP CAPABILITY, HIGHLY OXIDIZING DEPOSITION CONDITIONS, LOW-TEMPERATURE DEPOSITION CAPABILITY, AND EXCELLENT COMPOSITIONAL CONTROL. IN CONTRAST TO THE CASE OF III/V COMPOUND SEMICONDUCTORS, THE PRECURSORS COMMONLY AVAILABLE FOR Y, BA AND CU ARE LOW VOLATILITY SOLIDS. WHICH UNFORTUNATELY NEED SUBSTANTIAL HEATING (125-250 DEGREES CELSIUS) TO OBTAIN USEFUL GROWTH RATES. THIS DEMANDS HIGH TEMPERATURE COMPONENTS, HEATED LINES AND A MORE COMPLEX MOCVD SYSTEM DESIGN. THE HIGH TEMPERATURE, THOUGH ENCOURAGE A SIGNIFCANT DEGREE WHICH ADVERSELY AFFECTS THE DEPOSITION PROCESS.

* information listed above is at the time of submission.

Agency Micro-sites

SBA logo
Department of Agriculture logo
Department of Commerce logo
Department of Defense logo
Department of Education logo
Department of Energy logo
Department of Health and Human Services logo
Department of Homeland Security logo
Department of Transportation logo
Environmental Protection Agency logo
National Aeronautics and Space Administration logo
National Science Foundation logo
US Flag An Official Website of the United States Government