Thermoelectrically Cooled MWIR Avalanche Photodiodes on Silicon Substrates

Award Information
Agency: Department of Defense
Branch: Air Force
Contract: FA9550-06-C-0007
Agency Tracking Number: F045-021-0160
Amount: $749,903.00
Phase: Phase II
Program: STTR
Awards Year: 2006
Solitcitation Year: 2004
Solitcitation Topic Code: AF04-T021
Solitcitation Number: N/A
Small Business Information
EPIR TECHNOLOGIES INC
590 Territorial Drive, Suite B, Bolingbrook, IL, 60440
Duns: 068568588
Hubzone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Silviu Velicu
 R&D Director
 (630) 771-0203
 svelicu@epir.com
Business Contact
 Sivalingam Sivananthan
Title: President
Phone: (630) 771-0201
Email: siva@epir.com
Research Institution
 UNIV. OF ILLINOIS AT CHICAGO
 Siddhartha Ghosh
 1020 SEO, 851 S. Morgan St
Chicago, IL, 60607
 (630) 996-5256
 Nonprofit college or university
Abstract
MWIR avalanche photodetectors (APDs) are required in modern Air Force weapons systems to detect, recognize and track stationary and mobile targets under various atmospheric conditions against complex backgrounds. Theoretical and experimental results point toward HgCdTe as the material of choice for fabricating these devices, due to its low ratio of impact ionization coefficients. In Phase I we performed optical and electrical measurements to demonstrate the operation of MWIR HgCdTe PnN APDs up to 120K. Both absorption and multiplication took place in the low-doped n-type layer. For improved gain-bandwidth, lower excess noise properties and higher operating temperatures, separate absorption and multiplication (SAM) structures are necessary. Recent developments in molecular beam epitaxial (MBE) growth and monitoring techniques allow the growth of such HgCdTe multilayer heterostructures. We propose in this Phase II program to use our extensive experience in MBE growth and device processing to fabricate SAM thermoelectrically cooled MWIR HgCdTe APDs. Based on the success of the Phase I effort we plan to use silicon as the substrate material. EPIR Technologies would lead this effort with the responsibility for the optimization and growth of HgCdTe heterostructures with the desired properties for APD fabrication. The University of Illinois at Chicago will perform the device fabrication and characterization.

* information listed above is at the time of submission.

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