Development of Dilute Nitride SL Technology for VLWIR Detectors

Award Information
Agency:
Department of Defense
Branch
Missile Defense Agency
Amount:
$1,000,000.00
Award Year:
2007
Program:
STTR
Phase:
Phase II
Contract:
HQ0006-07-C-7653
Award Id:
78029
Agency Tracking Number:
B064-011-0126
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
1450 South Rolling Road, Baltimore, MD, 21227
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
171899719
Principal Investigator:
Ayub Fathimulla
Vice President, R&D
(410) 455-5830
afathimulla@epitaxialtechnologies.com
Business Contact:
Leye Aina
President
(410) 455-5594
oaina@epitaxialtechnologies.com
Research Institution:
UNIV. OF DELAWARE
James Kolodzey
Dept of Electrical & Computer
140 Evans Hall
Newark, DE 19716, DE, 19716
(302) 831-1164
Nonprofit college or university
Abstract
Epitaxial Technologies' overall objective is to develop innovative detector technologies that can be used to produce enhanced quantum efficiency and high detectivity VLWIR sensors that can operate at high temperatures. The goal of Phase II will be to improve the quality of the dilute nitride SL material structures and enhance the performance of the dilute Nitride IR detectors developed in Phase I to achieve VLWIR cut-off wavelengths in excess of 14-um, detectivities greater than 1E11 Jones. We will accomplish this by building on the results of Phase I, by designing and growing dilute nitride-based strained layer superlattice detector structures and by fabricating and testing the detectors. During Phase II, we will finalize the material structure, growth process, and fabrication process of the detectors. Further in Phase II, we will design, fabricate, and test 256 x 256 FPAs and demonstrate high operating temperatures as well as high pixel uniformity with operability greater than 98% and improved resolution with reduced noise.

* information listed above is at the time of submission.

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