Development of Dilute Nitride SL Technology for VLWIR Detectors

Award Information
Agency: Department of Defense
Branch: Missile Defense Agency
Contract: HQ0006-07-C-7653
Agency Tracking Number: B064-011-0126
Amount: $1,000,000.00
Phase: Phase II
Program: STTR
Awards Year: 2007
Solicitation Year: 2006
Solicitation Topic Code: MDA06-T011
Solicitation Number: N/A
Small Business Information
1450 South Rolling Road, Baltimore, MD, 21227
DUNS: 171899719
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: Y
Principal Investigator
 Ayub Fathimulla
 Vice President, R&D
 (410) 455-5830
Business Contact
 Leye Aina
Title: President
Phone: (410) 455-5594
Research Institution
 James Kolodzey
 Dept of Electrical & Computer
140 Evans Hall
Newark, DE 19716, DE, 19716
 (302) 831-1164
 Nonprofit college or university
Epitaxial Technologies' overall objective is to develop innovative detector technologies that can be used to produce enhanced quantum efficiency and high detectivity VLWIR sensors that can operate at high temperatures. The goal of Phase II will be to improve the quality of the dilute nitride SL material structures and enhance the performance of the dilute Nitride IR detectors developed in Phase I to achieve VLWIR cut-off wavelengths in excess of 14-um, detectivities greater than 1E11 Jones. We will accomplish this by building on the results of Phase I, by designing and growing dilute nitride-based strained layer superlattice detector structures and by fabricating and testing the detectors. During Phase II, we will finalize the material structure, growth process, and fabrication process of the detectors. Further in Phase II, we will design, fabricate, and test 256 x 256 FPAs and demonstrate high operating temperatures as well as high pixel uniformity with operability greater than 98% and improved resolution with reduced noise.

* Information listed above is at the time of submission. *

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